Gate-tunable bandgap in bilayer graphene

The tight-binding model of bilayer graphene is used to find the gap between the conduction and valence bands, as a function of both the gate voltage and as the doping by donors or acceptors. The total Hartree energy is minimized and the equation for the gap is obtained. This equation for the ratio of the gap to the chemical potential is determined only by the screening constant. Thus the gap is strictly proportional to the gate voltage or the carrier concentration in the absence of donors or acceptors. In the opposite case, where the donors or acceptors are present, the gap demonstrates the asymmetrical behavior on the electron and hole sides of the gate bias. A comparison with experimental data obtained by Kuzmenko et al demonstrates the good agreement.Comment: 6 pages, 5 figure

Influence of surface-related strain and electric field on acceptor wave functions in Zincblende semiconductors

The spatial distribution of the local density of states (LDOS) at Mn acceptors near the (110) surface of p-doped InAs is investigated by Scanning Tunneling Microscopy (STM). The shapes of the acceptor contrasts for different dopant depths under the surface are analyzed. Acceptors located within the first ten subsurface layers of the semiconductor show a lower symmetry than expected from theoretical predictions of the bulk acceptor wave function. They exhibit a (001) mirror asymmetry. The degree of asymmetry depends on the acceptor atoms' depths. The measured contrasts for acceptors buried below the 10th subsurface layer closely match the theoretically derived shape. Two effects are able to explain the symmetry reduction: the strain field of the surface relaxation and the tip-induced electric field.Comment: 8 pages, 4 figure

Electron Paramagnetic Resonance of Boron Acceptors in Isotopically Purified Silicon

The electron paramagnetic resonance (EPR) linewidths of B acceptors in Si are found to reduce dramatically in isotopically purified 28Si single crystals. Moreover, extremely narrow substructures in the EPR spectra are visible corresponding to either an enhancement or a reduction of the absorbed microwave on resonance. The origin of the substructures is attributed to a combination of simultaneous double excitation and spin relaxation in the four level spin system of the acceptors. A spin population model is developed which qualitatively describes the experimental results.Comment: 4 pages, 3 figure

Model of hopping dc conductivity via nearest neighbor boron atoms in moderately compensated diamond crystals

Expressions for dependences of the pre-exponential factor \sigma_3 and the thermal activation energy \epsilon_3 of hopping electric conductivity of holes via boron atoms on the boron atom concentration N and the compensation ratio K are obtained in the quasiclassical approximation. It is assumed that the acceptors (boron atoms) in charge states (0) and (-1) and the donors that compensate them in the charge state (+1) form a nonstoichiometric simple cubic lattice with translational period R_h = [(1 + K)N]^{-1/3} within the crystalline matrix. A hopping event occurs only over the distance R_h at a thermally activated accidental coincidence of the acceptor levels in charge states (0) and (-1). Donors block the fraction K/(1 - K) of impurity lattice sites. The hole hopping conductivity is averaged over all possible orientations of the lattice with respect to the external electric field direction. It is supposed that an acceptor band is formed by Gaussian fluctuations of the potential energy of boron atoms in charge state (-1) due to Coulomb interaction only between the ions at distance R_h. The shift of the acceptor band towards the top of the valence band with increasing N due to screening (in the Debye--H\"uckel approximation) of the impurity ions by holes hopping via acceptor states was taken into account. The calculated values of \sigma_3(N) and \epsilon_3(N) for K \approx 0.25 agree well with known experimental data at the insulator side of the insulator--metal phase transition. The calculation is carried out at a temperature two times lower than the transition temperature from hole transport in v-band of diamond to hopping conductance via boron atoms.Comment: 6 pages, 2 figure

Revealing puddles of electrons and holes in compensated topological insulators

Three-dimensional topological insulators harbour metallic surface states with exotic properties. In transport or optics, these properties are typically masked by defect-induced bulk carriers. Compensation of donors and acceptors reduces the carrier density, but the bulk resistivity remains disappointingly small. We show that measurements of the optical conductivity in BiSbTeSe$_2$ pinpoint the presence of electron-hole puddles in the bulk at low temperatures, which is essential for understanding DC bulk transport. The puddles arise from large fluctuations of the Coulomb potential of donors and acceptors, even in the case of full compensation. Surprisingly, the number of carriers appearing within puddles drops rapidly with increasing temperature and almost vanishes around 40 K. Monte Carlo simulations show that a highly non-linear screening effect arising from thermally activated carriers destroys the puddles at a temperature scale set by the Coulomb interaction between neighbouring dopants, explaining the experimental observation semi-quantitatively. This mechanism remains valid if donors and acceptors do not compensate perfectly.Comment: 11 pages with 7 figures plus supplemental material (3 pages

Role of defects and impurities in doping of GaN

We have calculated formation energies and position of the defect levels for all native defects and for a variety of donor and acceptor impurities employing first-principles total-energy calculations. An analysis of the numerical results gives direct insight into defect concentrations and impurity solubility with respect to growth parameters (temperature, chemical potentials) and into the mechanisms limiting the doping levels in GaN. We show how compensation and passivation by native defects or impurities, solubility issues, and incorporation of dopants on other sites influence the acceptor doping levels.Comment: 8 pages, 3 figures, to appear in "The Physics of Semiconductors