conference paper
oaioai:scholarbank.nus.edu.sg:10635/155053

Should the refractive index at 633 nm Be used to characterize silicon nitride films?

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Publication date
3 June 2019
Publisher
'Institute of Electrical and Electronics Engineers (IEEE)'
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    Abstract

    10.1109/PVSC.2017.83666822017 IEEE 44th Photovoltaic Specialist Conference, PVSC 20171-

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