Characterization of Cured Width under Wide Range of Gaussian Laser Exposure for Bulk Lithography

Abstract

AbstractDetermination of cured width is an important consideration especially for controlling the surface roughness of free down-facing surface of the three dimensional (3D) microstructure in ‘Bulk Lithography’ process. Classical Beer Lambert's law is used for predicting the photopolymerized width. However, experimental investigation reveals that Beer Lambert's law is limited to predict photopolymerized width only for small range of energy dose resulting from the smaller duration of exposure. This paper presents first experimental results and then proposes an enhanced semi-empirical cured width model applicable for wide range of laser exposure dose and duration