A positive-tone 2D direct-write technique that can achieve sub-wavelength patterning by non-linear overlap effects in a conventional polymer system is described. The technique involves relatively inexpensive free-space optics, skips the usual development step, and promises the possibility of a lithographic method that is solvent-free.United States. Army Research Office (Contract W911NF-07-D-0004)Semiconductor Research Corporatio
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