Evaluation of microwave microscopy for dielectric characterisation

Abstract

A widely used analytical, image charge, model of the SNMM was analysed for the first time in terms of its ability to predict the response of the SNMM to both bulk and thin film dielectrics. For the first time it was shown that the uncertainty in fitting to the model reduces from 10% to 5% when the length of the tip protruding from within the cavity is reduced from 2mm to 1mm. A 5% uncertainty in fitting to the image charge model for the measurement of the relative permittivity of bulk samples is demonstrated