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Modelling of nano-imprint forming process for the production of miniaturised 3D structures

By Stoyan Stoyanov, Farid Amalou, Keith I. Sinclair, Christopher Bailey and Marc P.Y. Desmulliez

Abstract

Nano-imprint forming (NIF) as manufacturing technology is ideally placed to enable high resolution, low-cost and high-throughput fabrication of three-dimensional fine structures and the packaging of heterogeneous micro-systems (S.Y. Chou and P.R. Krauss, 1997). This paper details a thermo-mechanical modelling methodology for optimising this process for different materials used in components such as mini-fluidics and bio-chemical systems, optoelectronics, photonics and health usage monitoring systems (HUMS). This work is part of a major UK Grand Challenge project - 3D-Mintegration - which is aiming to develop modelling and design technologies for the next generation of fabrication, assembly and test processes for 3D-miniaturised systems

Topics: TK, QA
Publisher: Institute of Electrical and Electronics Engineers, Inc.
Year: 2008
OAI identifier: oai:gala.gre.ac.uk:1249
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