Mikrowellen-PECVD für kontinuierliche Großflächenbeschichtung bei Atmosphärendruck

Abstract

Plasma processes are applied for a variety of surface modifications. Examples are coatings to achieve an improved corrosion and scratch protection, or surface cleaning. Normally, these processes are vacuum based and therefore suitable to only a limited extend for large area industrial applications. By use of atm. pressure plasma technol. integration in continuously working manufg. lines is advantageously combined with lower costs and higher throughput. Microwave plasma sources present powerful modules for plasma enhanced chem. vapor deposition at atm. pressure. At Fraunhofer IWS processes and equipment as well as application specific materials are developed. The coatings are suitable for scratch resistant surfaces, barrier and corrosion protective layers or antireflex layers on solar cells. The film properties achieved are comparable with those produced by low pressure processes