Processing issues in silicon nanocrystal manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications
Abstract
Abstract is not available.- Ion beam synthesis
- Nanocrystal memory
- Non-volatile memory
- Silicon implantation
- Silicon nanocrystals
- Ion beams
- Ion implantation
- MOS capacitors
- Nonvolatile storage
- Plasma applications
- PROM
- Semiconducting silicon
- Threshold voltage
- Prototype devices
- Nanostructured materials
- Ion beam synthesis
- Nanocrystal memory
- Non-volatile memory
- Silicon implantation
- Silicon nanocrystals
- Ion beams
- Ion implantation
- MOS capacitors
- Nonvolatile storage
- Plasma applications
- PROM
- Semiconducting silicon
- Threshold voltage
- Ion beam synthesis
- Nanocrystal memory
- Prototype devices
- Silicon nanocrystals
- Nanostructured materials
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Last time updated on 03/06/2016
This paper was published in DSpace@NTUA (National Technical Univ. of Athens).
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