Ultraviolet poling of pure fused silica by high-intensity femtosecond radiation

Abstract

We demonstrate UV poling of a pure fused silica sample by applying to it an electric field of 200 kV/cm and irradiating it with high-intensity (~40 GW/cm) femtosecond (220 fs) laser pulses at 264 nm

Similar works

Full text

thumbnail-image

Southampton (e-Prints Soton)

redirect
Last time updated on 02/07/2012

This paper was published in Southampton (e-Prints Soton).

Having an issue?

Is data on this page outdated, violates copyrights or anything else? Report the problem now and we will take corresponding actions after reviewing your request.