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Nanoimprint lithography for planar chiral photonic meta-materials

By Yifang Chen, Jiarui Tao, Xinghong Zhao, Zheng Cui, Alexander S. Schwanecke and Nikolay I. Zheludev

Abstract

Room temperature nanoimprint lithography has successfully been applied to the fabrication of planar chiral photonic meta-materials. For dielectric chiral structures a single layer of thick HSQ was used while for metallic chiral structures a bi-layer technique using PMMA/hydrogen silsequioxane (HSQ) was applied. The polarization conversion capabilities of planar chiral structures imprinted in dielectric materials have experimentally been observed. This indicates that the developed processes in this work have the prospect of manufacturing planar photonic meta media in high volume at low cost

Topics: TK, QC
Year: 2005
OAI identifier: oai:eprints.soton.ac.uk:28739
Provided by: e-Prints Soton

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Citations

  1. (2003). Kaiwu Peng, Zheng Cui,
  2. (2005). Xingzhong Zhao and Zheng Cui, in:

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