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XPS and TEM study of deposited and Ru–Si solid state reaction grown ruthenium silicides on silicon

By Emil V. Jelenković, S. To, M.G. Blackford, O. Kutsay and Shrawan K. Jha
Publisher: Elsevier BV
Year: 2015
DOI identifier: 10.1016/j.mssp.2015.07.085
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Provided by: MUCC (Crossref)
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