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A radiation model of a rapid thermal processing system.

By Abigail Wacher and Brian Seymour

Abstract

A model of the radiative heat transfer that takes place in an\ud axially symmetric rapid thermal processing chamber is presented. The model is derived using the theory of shape factors, and is used to predict how chamber geometry and materials affect temperature uniformity on the processed silicon wafer. Using a series of numerical experiments we predict the effects on the temperature uniformity of the size and reflectivity of the showerhead, the guard ring, and the chamber height

Topics: Radiation, Modelling, Rapid Thermal Processing, Industrial mathematical modelling.
Publisher: Springer
Year: 2011
OAI identifier: oai:dro.dur.ac.uk.OAI2:7913
Journal:

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