Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Dabirian, Ali; Kuzminykh, Yury; Wagner, Estelle; Benvenuti, Giacomo; Rushworth, Simon A.; Hoffmann, Patrik

research article

oai:infoscience.tind.io:178591

Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Authors: Ali Dabirian
Yury Kuzminykh
Estelle Wagner
Giacomo Benvenuti
Simon A. Rushworth
Patrik Hoffmann
Publication date: 21 May 2025
Publisher
Doi

Abstract

Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and desorption-limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments (see picture). Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.LOALPMA

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Infoscience - École polytechnique fédérale de Lausanne

oai:infoscience.tind.io:178591

Last time updated on 09/02/2018

This paper was published in Infoscience - École polytechnique fédérale de Lausanne.

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