oaioai:ir.nimte.ac.cn/:174433/13849

Growth of mirror-like ultra-nanocrystalline diamond (UNCD) films by a facile hybrid CVD approach

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Publication date
1 January 2017
Publisher
Doi

    Abstract

    In this study, growth of mirror-like ultra-nanocrystalline diamond (UNCD) films by a facile hybrid CVD approach was presented. The nucleation and deposition of UNCD films were conducted in microwave plasma CVD (MPCVD) and direct current glow discharge CVD (DC GD CVD) on silicon substrates, respectively. A very high nucleation density (about 1 x 10(11) nuclei cm(-2)) was obtained after plasma pretreatment. Furthermore, large area mirror-like UNCD films of Phi 50 mm were synthesized by DC GD CVD. The thickness and grain size of the UNCD films are 24 mu m and 7.1 nm, respectively. In addition, the deposition mechanism of the UNCD films was discussed

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    Last time updated on 22/01/2018

    This paper was published in Institutional Repository of Ningbo Institute of Material Technology & Engineering, CAS.

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