Location of Repository

CHIRAL UNIVERSES AND QUANTUM EFFECTS PRODUCED BY ELECTROMAGNETIC FIELDS UNIVERSOS QUIRALES Y EFECTOS CUÁNTICOS PRODUCIDOS POR CAMPOS ELECTROMAGNÉTICOS

By Héctor Torres-Silva

Abstract

The accepted structure of space and vacuum derives from the results of relativistic cosmology and quantum field theory. It is demonstrated that a chiral interface between enantiomeric regions of a closed universe, or a (right) R-Universe and (left) L-Universe, related by an element of PCT symmetry along the interface, represents a construct with all the attributes required of the theoretical vacuum, in-so-far as quantum behaviour is then seen to be induced by the vacuum interface. Quantum mechanics emerges as a special case of classical mechanics, rather than the latter being a subset of the former. This removes the quantum-mechanical observational problem, explains the cosmological large-number coincidences, and accounts for the anti-matter in the cosmos.<br>La estructura aceptada del espacio y el vacío se derivan de los resultados de la cosmología relativística y de la teoría cuántica de campo. Se demuestra que una interfaz quiral entre regiones enantioméricas de un universo cerrado, o un universo derecho y un universo izquierdo, relacionados por un elemento de simetría PCT a lo largo de la interfaz, representa un modelo con todos los atributos requeridos por el vacío teórico. Se desprende que el comportamiento cuántico es entonces visto que es inducido por la interfaz de vacío. La mecánica quántica emerge como un caso especial de la mecánica clásica, más bien que siendo la última un subconjunto de la primera. Esto resuelve el problema observacional mecánico cuántico, explica las coincidencias de los grandes números cosmológicos y toma en cuenta la antimateria en el cosmos

Topics: Vacío, interfaz quiral, campo cuántico, universo derecho (izquierdo), Vacuum, chiral interface, quantum field R (L)-Universe, Mechanical engineering and machinery, TJ1-1570, Technology, T, DOAJ:Mechanical Engineering, DOAJ:Technology and Engineering, Industrial engineering. Management engineering, T55.4-60.8, Technology (General), T1-995, DOAJ:Industrial Engineering
Publisher: Universidad de Tarapacá
Year: 2008
OAI identifier: oai:doaj.org/article:18363f8c02f34b8c85ecebe6633272b9
Journal:
Download PDF:
Sorry, we are unable to provide the full text but you may find it at the following location(s):
  • https://doaj.org/toc/0718-3305 (external link)
  • https://doaj.org/toc/0718-3291 (external link)
  • http://www.scielo.cl/scielo.ph... (external link)
  • https://doaj.org/article/18363... (external link)
  • Suggested articles


    To submit an update or takedown request for this paper, please submit an Update/Correction/Removal Request.