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Advanced coatings through pulsed magnetron sputtering

By PJ Kelly, J Hisek, Y Zhou, RD Pilkington and RD Arnell


Pulsed magnetron sputtering (PMS) has become\ud established as the process of choice for the deposition\ud of dielectric materials for many applications. The\ud process is attractive because it offers stable arc free\ud operating conditions during the deposition of, for\ud example, functional films on architectural and automotive\ud glass, or antireflective/antistatic coatings on\ud displays. Recent studies have shown that pulsing the\ud magnetron discharge also leads to hotter and more\ud energetic plasmas in comparison with continuous dc\ud discharges, with increased ion energy fluxes delivered to\ud the substrate. As such, the PMS process offers benefits\ud in the deposition of a wide range of materials. The\ud present paper describes three examples where PMS has\ud led to either significant enhancement in film properties\ud or enhanced process flexibility: in low friction titanium\ud nitride coatings, in Al doped zinc oxide transparent\ud conductive oxide coatings sputtered directly from\ud powder targets and in thin film photovoltaic devices\ud based on copper (indium/gallium) diselenide. These\ud examples demonstrate the versatility of PMS and open\ud up new opportunities for the production of advanced\ud coatings using this technique

Topics: TA401, QD, QC, built_and_human_env, other
Publisher: Maney Publishing
OAI identifier:

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