The electronic structure of interfaces between lattice-mismatched
semiconductor is sensitive to the strain. We compare two approaches for
calculating such inhomogeneous strain -- continuum elasticity (CE, treated as a
finite difference problem) and atomistic elasticity (AE). While for small
strain the two methods must agree, for the large strains that exist between
lattice-mismatched III-V semiconductors (e.g. 7% for InAs/GaAs outside the
linearity regime of CE) there are discrepancies. We compare the strain profile
obtained by both approaches (including the approximation of the correct C_2
symmetry by the C_4 symmetry in the CE method), when applied to C_2-symmetric
InAs pyramidal dots capped by GaAs.Comment: To appear in J. Appl. Physic