A simple and highly reproducible technique is demonstrated for the
fabrication of metallic electrodes with nanometer separation. Commercially
available bare gold colloidal nanoparticles are first trapped between
prefabricated large-separation electrodes to form a low-resistance bridge by an
ac electric field. A large dc voltage is then applied to break the bridge via
electromigration at room temperature, which consistently produces gaps in the
sub-10 nm range. The technique is readily applied to prefabricated electrodes
with separation up to 1 micron, which can be defined using optical lithography.
The simple fabrication scheme will facilitate electronic transport studies of
individual nanostructures made by chemical synthesis. As an example,
measurement of a thiol-coated gold nanoparticle showing a clear Coulomb
staircase is presented.Comment: To appear in Appl. Phys. Lett. in Dec. 200