We report on the precise integration of nm-scale topological insulator
Josephson junctions into mm-scale superconducting quantum circuits via
selective area epitaxy and local stencil lithography. By studying dielectric
losses of superconducting microwave resonators fabricated on top of our
selective area growth mask, we verify the compatibility of this in situ
technique with microwave applications. We probe the microwave response of
on-chip microwave cavities coupled to topological insulator-shunted
superconducting qubit devices and observe a power dependence that indicates
nonlinear qubit behaviour. Our method enables integration of complex networks
of topological insulator nanostructures into superconducting circuits, paving
the way for both novel voltage-controlled Josephson and topological qubits.Comment: 11 pages, 6 figure