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Atomic layer deposition of
HfO
2
\text {HfO}_2
HfO
2
HfO2 for integration into three-dimensional metal–insulator–metal devices
Authors
A Callegari
A Kumar
+50 more
C Morant
CT Tsai
D Barreca
D Gu
E Moyen
E Moyen
EP Gusev
F Roozeboom
GD Wilk
Guillaume Monier
H Masuda
I Perez
J Aarik
J Aarik
J Choi
JH Klootwijk
JW Elam
K Kukli
K M.
K Pitzschel
K Xu
KB Shelimov
Kristina Pitzschel
L Assaud
LC Haspert
Lionel Santinacci
LJ Li
Loïc Assaud
M Putkonen
M Toledano-Luque
Margrit Hanbücken
Matthieu Petit
Maïssa K. S. Barr
MG Willinger
MJ Choi
MKS Barr
P Banerjee
PD Kirsch
RC Smith
RG Gordon
SM George
Sw Chang
T Bertaud
V Miikkulainen
X Fan
X Liu
X Zhao
Y Matveyev
Y Senzaki
Y Wu
Publication date
Publisher
'Springer Science and Business Media LLC'
Doi
Cite
Abstract
Abstract is not available.
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info:doi/10.1007%2Fs00339-017-...
Last time updated on 02/01/2020