CORE
🇺🇦
make metadata, not war
Services
Services overview
Explore all CORE services
Access to raw data
API
Dataset
FastSync
Content discovery
Recommender
Discovery
OAI identifiers
OAI Resolver
Managing content
Dashboard
Bespoke contracts
Consultancy services
Support us
Support us
Membership
Sponsorship
Community governance
Advisory Board
Board of supporters
Research network
About
About us
Our mission
Team
Blog
FAQs
Contact us
Source/drain contact resistance of silicided thin-film SOI MOSFET\u27s
Authors
Satoshi Andoh
Toshihiro Sugii
+3 more
Kunihiro Suzuki
Tetsu Tanaka
Yoshiharu Tosaka
Publication date
21 April 2010
Publisher
'Institute of Electrical and Electronics Engineers (IEEE)'
Doi
Abstract
Abstract is not available.
Similar works
Full text
Open in the Core reader
Download PDF
Available Versions
Tohoku University Repository (TOUR) / 東北大学機関リポジトリ
See this paper in CORE
Go to the repository landing page
Download from data provider
oai:tohoku.repo.nii.ac.jp:0004...
Last time updated on 30/10/2019
Institutional Repositories DataBase (IRDB)
See this paper in CORE
Go to the repository landing page
Download from data provider
oai:irdb.nii.ac.jp:00918:00004...
Last time updated on 06/09/2020