A novel technique of high-density gaseous plasma generation was explored, and several plasma sources based on this technique were developed. The sources utilize a DC high-current (up to 35 A) gaseous discharge with electron injection into the cathode region. Electron generation and injection is accomplished by using an additional arc discharge with a cold hollow cathode. Low contamination of plasma is achieved by low discharge voltage (avoidance of sputtering), as well as by special geometric configuration of the emitter discharge electrodes thereby filtering (removing) the erosion products stemming from the emitter cathode. The devices produce a uniform and stable gaseous plasmas with density up to 1011 cm-3 in a volume of 1 m3, at the pressure of 3x10-4 Torr and higher. The sources are characterized by high reliability, low maintenance and long lifetime. The specific electric power consumption is 140 eV per one generated ion. The sources operate with noble gases, nitrogen, oxygen and hydrocarbons, and can be used for plasma immersion ion implantation and other ion technologies
