Preparation of Few-Layer MoS<sub>2</sub> Nanosheets
via an Efficient Shearing Exfoliation Method
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Abstract
In this paper, we selected a less
studied high-speed dispersive
homogenizer as a shear-exfoliating device and selected NMP which matches
the surface energy of MoS<sub>2</sub> as a solvent to prepare few-layer
MoS<sub>2</sub> nanosheets. The effects of operating parameters on
the concentration of few-layer MoS<sub>2</sub> nanosheets were systematically
studied. The results showed that the change of operating conditions
has a direct influence on the exfoliation effects. The concentration
of MoS<sub>2</sub> nanosheets was 0.96 mg/mL in pure NMP under the
optimized conditions. The concentration reached 1.44 mg/mL, and the
highest yield was 4.8% after adding sodium citrate. Particularly,
their lateral size is about 50β200 nm, in which almost 65%
of MoS<sub>2</sub> nanosheets are less than four layers and 9% are
monolayer. It was verified that the as-used exfoliation method is
simple and highly efficient