Active Sites of Pd-Doped Flat and Stepped Cu(111)
Surfaces for H<sub>2</sub> Dissociation in Heterogeneous Catalytic
Hydrogenation
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Abstract
It
has been shown in recent experiments that the Cu(111) surface doped
by a small amount of Pd atoms can exhibit excellent catalytic performance
toward the dissociation of H<sub>2</sub> molecules. Here we performed
systematic first-principles calculations to investigate the corresponding
mechanism. Our results clearly demonstrate that a very small number
of Pd atoms in the subsurface layer can effectively reduce the energy
barrier of H<sub>2</sub> dissociation, making the ensembles composed
of the surface and contiguous subsurface Pd atoms as the active sites.
The catalytic activity can be further improved if the Pd atoms are
doped in the stepped Cu surfaces. The impact of the subsurface Pd
atoms comes from an enhanced surface–adsorbate interaction
caused by adjusting the electronic structure of the substrate. The
important role played by the subsurface atoms offers an efficient
approach to finely tune the surface activity by a very limited number
of atoms. Our findings should be very useful for understanding and
improving the catalytic properties of alloy systems for the industrially
important hydrogenation reactions