In this study, we present a novel
application of thin magnesium fluoride films to form electron–selective
contacts to <i>n</i>-type crystalline silicon (c-Si). This
allows the demonstration of a 20.1%-efficient c-Si solar cell. The
electron-selective contact is composed of deposited layers of amorphous
silicon (∼6.5 nm), magnesium fluoride (∼1 nm), and aluminum
(∼300 nm). X-ray photoelectron spectroscopy reveals a work
function of 3.5 eV at the MgF<sub>2</sub>/Al interface, significantly
lower than that of aluminum itself (∼4.2 eV), enabling an Ohmic
contact between the aluminum electrode and <i>n</i>-type
c-Si. The optimized contact structure exhibits a contact resistivity
of ∼76 mΩ·cm<sup>2</sup>, sufficiently low for a
full-area contact to solar cells, together with a very low contact
recombination current density of ∼10 fA/cm<sup>2</sup>. We
demonstrate that electrodes functionalized with thin magnesium fluoride
films significantly improve the performance of silicon solar cells.
The novel contacts can potentially be implemented also in organic
optoelectronic devices, including photovoltaics, thin film transistors,
or light emitting diodes