Flexible
transparent conductive electrodes (FTCEs) are essential
components for numerous optoelectronic devices. In this work, we have
fabricated the hierarchical metal grids (HMG) FTCEs by a facile and
low-cost, near-field photolithography strategy. Compared to normal
metal grids (MG), the HMG structure can provide distinctly increased
conductivity of the electrode yet without obvious reduction of the
optical transmittance. This HMG sample possesses excellent optoelectronic
performance and high mechanical flexibility, making it a promising
component for practical applications
