Sonstige Einrichtungen. INM Leibniz-Institut für Neue Materialien
Doi
Abstract
The photolysis of the silicon diazide 3a in benzene solution and in an Ar matrix is described. Both irradiations cause the elimination of 3 equivalents of N2. Loss of N2 from 3a in benzene leads to the formation of the analytically investigated product or products 4 of uncertain structure. However, the matrix photolysis of 3a results in a compound which is stable up to 77 K and has been identified as the bis(amino)silylene 2 d by comparison of its IR spectra with those of the homologous Sn and Ge compond