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Materials meeting electronic requirements for Sub-10 nm lithography
Authors
I. Cayrefourcq
X. Chevalier
+9 more
G. Fleury
G. Hadziioannou
M. A. Hockey
A. Legrain
C. Navarro
C. Nicolet
L. Pain
K. Xu
M. Zelsmann
Publication date
1 October 2017
Publisher
HAL CCSD
Abstract
International audienc
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Hal - Université Grenoble Alpes
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oai:HAL:hal-01930180v1
Last time updated on 07/01/2019
HAL-CEA
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oai:HAL:hal-01930180v1
Last time updated on 20/03/2019
