The motivation for this presentation is that growing inverted cells may enable technological advances in solar cell fabrication, leading to higher efficiencies. Differences in dopant diffusion during inverted vs. upright growths may lead to differences in atomic depth profiles; changes in carrier concentrations; higher contact resistance and lower overall performance. This presentation summarizes that excellent performance is achievable in both upright and inverted configurations with proper consideration; subtle differences in depth profile QE and JV between upright and inverted growths due to dopant diffusion; and GaInAsN contact layer is resilient to length annealing and more work is necessary to determine why
