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The effect of argon pressure on the structural and photocatalytic characteristics of TiO2 thin films deposited by d.c. magnetron sputtering
Authors
Roger De Gryse
Karin Eufinger
+4 more
Els Janssen
Guy Marin
Dirk Poelman
Hilde Poelman
Publication date
1 January 2005
Publisher
ELSEVIER SCIENCE SA
Doi
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Abstract
Abstract is not available.
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oai:archive.ugent.be:4257504
Last time updated on 12/11/2016
