Measurement of the Kerr nonlinear refractive index and its variation among 4H-SiC wafers

Abstract

The unique material property of silicon carbide (SiC) and the recent demonstration of low-loss SiC-on-insulator integrated photonics platform have attracted considerable research interests for chip-scale photonic and quantum applications. Here, we carry out a thorough investigation of the Kerr nonlinearity among 4H-SiC wafers from several major wafer manufacturers, and reveal for the first time that their Kerr nonlinear refractive index can be significantly different. By eliminating various measurement errors in the four-wave mixing experiment and improving the theoretical modeling for high-index-contrast waveguides, the best Kerr nonlinear refractive index of 4H-SiC wafers is estimated to be approximately four times of that of stoichiometric silicon nitride in the telecommunication band. In addition, experimental evidence is developed that the Kerr nonlinearity in 4H-SiC wafers can be stronger along the c-axis than that in the orthogonal direction, a feature that was never reported before