Polarity-Tunable
Photocurrent through Band Alignment
Engineering in a High-Speed WSe<sub>2</sub>/SnSe<sub>2</sub> Diode
with Large Negative Responsivity
Excellent
light–matter interaction and a wide range of thickness-tunable
bandgaps in layered vdW materials coupled by the facile fabrication
of heterostructures have enabled several avenues for optoelectronic
applications. Realization of high photoresponsivity at fast switching
speeds is a critical challenge for 2D optoelectronics to enable high-performance
photodetection for optical communication. Moving away from conventional
type-II heterostructure pn junctions towards a WSe2/SnSe2 type-III configuration, we leverage the steep change in tunneling
current along with a light-induced heterointerface band shift to achieve
high negative photoresponsivity, while the fast carrier transport
under tunneling results in high speed. In addition, the photocurrent
can be controllably switched from positive to negative values, with
∼104× enhancement in responsivity, by engineering
the band alignment from type-II to type-III using either the drain
or the gate bias. This is further reinforced by electric-field dependent
interlayer band structure calculations using density functional theory.
The high negative responsivity of 2 × 104 A/W and
fast response time of ∼1 μs coupled with a polarity-tunable
photocurrent can lead to the development of next-generation multifunctional
optoelectronic devices