Since transition
metal dichalcogenide (TMD) semiconductors are
found as two-dimensional van der Waals materials with a discrete energy
bandgap, many TMD based field effect transistors (FETs) are reported
as prototype devices. However, overall reports indicate that threshold
voltage (Vth) of those FETs are located
far away from 0 V whether the channel is p- or n-type. This definitely
causes high switching voltage and unintended OFF-state leakage current.
Here, a facile way to simultaneously modulate the Vth of both p- and n-channel FETs with TMDs is reported.
The deposition of various organic small molecules on the channel results
in charge transfer between the organic molecule and TMD channels.
Especially, HAT-CN molecule is found to ideally work for both p- and
n-channels, shifting their Vth toward
0 V concurrently. As a proof of concept, a complementary metal oxide
semiconductor (CMOS) inverter with p-MoTe2 and n-MoS2 channels shows superior voltage gain and minimal power consumption
after HAT-CN deposition, compared to its initial performance. When
the same TMD FETs of the CMOS structure are integrated into an OLED
pixel circuit for ambipolar switching, the circuit with HAT-CN film
demonstrates complete ON/OFF switching of OLED pixel, which was not
switched off without HAT-CN