Hydrogen silsesquioxane (HSQ) is a versatile inorganic material that has garnered significant attention in the semiconductor industry, such as in micro-/nano-electromechanical systems, photonic devices, and nanoelectronics, owing to its high silicon content, small molecular size, low dielectric constant, excellent line edge roughness, high etching resistance, and local planarization capabilities. This review article discusses the application-related aspects of HSQ in nanomanufacturing for integrated circuits and nanoscale patterning, and the technical applications of HSQ in the fabrication of semiconductor silicon-based nanomaterials.departmental bulletin pape
