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conference paper research article text
Enabling proximity mask-aligner lithography with a 193nm CW light source
Authors
R. Kirner
P. Leisching
+7 more
W. Noell
D. Opalevs
Carsten Rockstuhl
T. Scharf
M. Scholz
Andreas Vetter
R. Voelkel
Publication date
1 January 2018
Publisher
Society of Photo-optical Instrumentation Engineers
Doi
Cite
Abstract
Abstract is not available.
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Repository KITopen
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oai:EVASTAR-Karlsruhe.de:10000...
Last time updated on 08/05/2025
Crossref
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info:doi/10.1117%2F12.2297171
Last time updated on 06/08/2021
