Self-textured ZnO via AACVD of alkyl alkoxides: a solution-based seed-less route towards optoelectronic-grade coatings

Abstract

Carbon-free, crystalline and transparent (002)-oriented ZnO films with thickness below 200 nm were deposited at 350 °C on plain glass via AACVD. ZnO films restricted to PVD-growth are achievable through a fast, cost-effective and scalable methodology