21st International Symposium on Heavy Ion Inertial Fusion. Autonomous Organization of Education “Nazarbayev University”
Abstract
The surface peeling process induced by intense
pulsed ion beam (IPIB) irradiation was studied.
Single crystal silicon specimens were treated by
IPIB with accelerating voltage of 350 kV current
density of 130 A/cm2. It is observed that
under smaller numbers of IPIB shots, the surface
may undergo obvious melting and evaporation..
