GaN is an attractive material for use in high-temperature or high-power electronic devices due to its high bandgap (3.39 eV), high breakdown field ({approximately}5 {times} 10{sup 6} V/cm), high saturation drift velocity (2.7 {times} 10{sup 7} cm/s), and chemical inertness. To this end, Metal Semiconductor FETs (MESFETs), High Electron Mobility Transistors (HEMTs), Heterostructure FETs (HFETs), and Metal Insulator Semiconductor FETs (MISFETs) have all been reported based on epitaxial AlN/GaN structures (Khan 1993a,b; Binari 1994 and 1995). GaN Junction Field Effect Transistors (JFETs), however, had not been reported until recently (Zolper 1996b). JFETs are attractive for high-temperature operation due to the inherently higher thermal stability of the p/n junction gate of a JFET as compared to the Schottky barrier gate of a MESFET or HFET. In this paper the authors present the first results for elevated temperature performance of a GaN JFET. Although the forward gate properties are well behaved at higher temperatures, the reverse characteristics show increased leakage at elevated temperature. However, the increased date leakage alone does not explain the observed increase in drain current with temperature. Therefore, they believe this first device is limited by temperature activated substrate conduction

Baca, A. G.

Hietala, V. M.

Pearton, S. J.

Shul, R. J.

Stall, R. A.

Wilson, R. G.

Zolper, J. C.

UNT Digital Library

- C.oNF- L ? ~ o  6 / 5 9 -  -5 GALLIUM NITRIDE JUNCTION FIELD EFFECT TRANSISTORS FOR HIGH- TEMPERATURE OPERATION J. C. Zolper MS0603Dept 1 3 14 Sandia National Labs Albuquerque, NM 87 185 jczolpe@sandia.gov V. M. Hietala MS0603Dept 13 13 Sandia National Labs Albuquerque, NM 87 185 vmhieta@ sandia.gov R. G. Wilson Hughes Research Labs 301 1 Malibu Canyon Rd Malibu CA 90265 PH: 505-845-9709, FAX: 505-844-8985 P H  5OS844-5849 FAX: 505-844-8985 PH: 310-317-5292 FAX: 310-317-5483 R. J. Shul MS 0603Dep t 1 3 14 Sandia National Labs Albuquerque, NM 87 185 rjshul@sandia.gov PH: 505-844-6126 FAX: 505-844-8985 S. J. Pearton Dept. of Mat Sci & Eng. Un. of Florida Gainesville FL 3 16 1 1 PH: 904-846-1086 FAX: 904-846-1 182 A. G. Baca MS0603Dept 1314 Sandia National Labs Albuquerque, NM 87 185 agbaca@ sandia.gov R. A. Stall Emcore Corp. 35 Elizabeth Ave Somerset NJ 08873 PH: 505-84-7 127 FAX: 505-844-8985 P H  908-271-9090 FAX: 908-27 1-9686 GaN is an attractive material for use in high-temperature or high-power electronic devices due to its high bandgap (3.39 eV), high breakdown field (4x106 V/cm), high saturation drift velocity (2.7~107 cm/s), and chemical inertness (Morkoc 1994; Chow 1994). To this end, Metal Semiconductor FETs (MESFETs), High Electron Mobility Transistors (HEMTs), Heterostructure FETs (HFETs), and Metal Insulator - Semiconductor FETs (MISFETs) have all been reported based on epitaxial AlN/GaN structures (Khan 1993a,b; Binari 1994 and 1995). GaN Junction Field Effect Transistors (JFETs), however, had not been reported until recently (Zolper 1996b). JFETs are attractive for high-temperature operation due to the inherently higher thermal stability of the p/n junction gate of a JFET as compared to the Schottky barrier gate of a MESFET or HFET. In this paper we present the first results for elevated temperature performance of a GaN J E T .  Although the forward gate properties are well behaved at higher temperatures, the reverse characteristics show increased leakage at elevated temperature. However, the increased gate leakage alone does not explain the observed increased in drain current with temperature. Therefore, we believe this first device is limited by temperature activated substrate conduction. INTRODUCTION; As mentioned above, GaN based electronics are being developed for high- temperature operation. GaN MESFETs, HFETs, and MISFETs have all been reported, and recently GaN junction field effect transistors (JFETs) have also been demonstrated (Zolper 1996b). The advantages of a JFET structure, which have been clearly demonstrated for GaAs-based devices (Zolper 1994a,b), result from the higher gate turn- on voltage compared to a MESFET due its p/n junction gate. For high-temperature DISCLAIMER This report was prepared as an account of work sponsored by an agency of the United States Government. Neither the United States Government oor any agency thereof, nor any of their employees, makes any warranty, express or implied, or assumes any legal liability or responsibility for the accuracy, completeness, or use- fulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any spe- cific commercial product, process, or service by trade name, trademark, manufac- turer, or otherwise does not necessarily constitute or imply its endorsement, m m -  mendation, or favoring by the United States Government or any agency thereof. The views and opinions of authors expressed herein do not necessarily state or reflect those of the United States Government or any agency thereof. Portions of this document may be i)ie#ble in electronic image products. lunges are produced from the best available original dowment . operation, a JFET will have less gate leakage current than a Schottky gate device due to the higher built-in voltage of the p/n junction. Furthermore, the gate of a JFET will be metallurgically more stable than a Schottky gate MESFET or W E T  since gate rectification does not rely on a metal/semiconductor interface, as in a Schottky gate, but rather a buried p/n junction that will withstand higher temperature operation. In addition, since the channel of a JFET is effectively buried below the surface, this structure should be more environmentally robust (Zipperian 1986). For all the above reasons, a JFET should be able to operate at higher temperatures than a Schottky barrier device such as a MESFET or HFET. As has been shown for GaAs-based JFETs (Zolper 1994a,b), ion implantation is an attractive technology for forming the selectively doped regions and for minimizing the JFET parasitic capacitance's. With the demonstrztion of n- and p-type ion implantation doping of GaN using Si and Mg (Pearton 1995) or Ca (Zolper 1996a) respectively, fabrication of an all ion implanted GaN JFET has now been reported (Zolper 1996b). After reviewing the fabrication of the GaN JFET and presenting its room temperature performance, we present the f is t  elevated temperature results for this device. JFET FABRICATION: The GaN layers used in the experiments were 1.5 to 2.0 pm thick grown on c- plane sapphire substrates by metalorganic chemical vapor deposition (MOCVD) in a multiwafer rotating disk reactor at 1040 "C with a -20 nm GaN buffer layer grown at 530 "C (Yuan 1995). The GaN layers were semi-insulating with background n-type carrier concentration I 1x1016 cm-3. The as-grown layers had featureless surfaces and were transparent with a strong bandedge luminescence at 3.484 eV at 14 K. I SI-GaN I FIG 1. Schematic of ion implanted GaN JFET (Drawing not to scale). Figure 1 shows a schematic of the ion implanted GaN JFET structure. The key processing steps are as follows: 1) selective area ion implantation of the n-channel (28Si: 100 keV, 2x1014 cm-2) and p-gate 40Ca (40 keV, 5x1014 cm-2), 2) sputter deposition of 300 nm of W gate contact metal, 3) R E  gate contact patterning using an SFdAr plasma, 4) selective area, non-self-aligned 28Si ion implantation of the source and drain regions, 5) a 1150 "C, 15 s rapid thermal anneal to activate the implanted dopants, 6 )  ECR-plasma etching of -50 nm of p-GaN from the source and drain regions using a BC13/HgAr chemistry (Shul 1995) 7) deposition of Ti/Al (20 nm/ 200 nm) ohmic metal, and 8) 500 'C, 15 s ohmic alloy. This structure minimizes the gate capacitance often associated with JFETs by self-aligning the p-type gate to the gate contact metal. In addition, since the doping was done in selective areas, device isolation was realized via the semi-insulating properties of the GaN substrate. That is, no implant isolation or mesa etch isolation was required to isolate these devices. An important feature of this device structure is that the W-gate contact is in-place during the high temperature implant activation anneal. This will allow for self-aligned source-and-drain implants as has been demonstrated in GaAs JFETs (Zolper 1994a,b). However, this approach also requires that the W not spike down through the p/n junction during the anneal. Figure 2 shows Auger depth profiles for W on GaN either as deposited or after a 1100 OC, 15 s anneal. By comparing the two rofiles, we estimate diffusing out into the W over a distance of -300 A. Therefore, the Auger data demonstrates that the W/GaN interface is sufficiently stable during the implant activation anneal since the junction depth is expected to be near 450 A and it is the indiffusion of W that could short the junction. This annealing data also demonstrates the extreme thermal stability of this gate structure for high temperature device operation. that after annealing the W has diffused into the GaN by only -100 K while Ga and N are 0 200 400 600 800 1000 depth (4 depth (4 (a) (b) FIG 2. Auger depth profiled of W on GaN either a) as deposited or b) after a 15s, 1100 O C  anneal. W indiffusion is estimated to be 100 8, after annealing. Figure 3 shows the room temperature IDS versus VDS curves for varied gate biases for a -1.7 pm x 50 pm GaN JFEZT with a 4 pm source-to-drain spacing. The JFET demonstrates good modulation characteristics with nearly complete pinch-off at a threshold voltage of approximately -6 V for VDS = -7V. For VDS = 25 V, a maximum transconductance of 7 mS/mm was measured at VGS = -2.0 V with a saturation current of 33 mA/mm at VGS = 0 V. The reverse breakdown voltage of the gate junction is estimated to be - 35 V. Four-probe measurements of the source resistance gave Rs = 500 Q. Although this value of Rs is extremely large, it only accounts for a 20% reduction in the external transconductance with respect to a corrected internal transconductance of 8.5 mS/mm. This high resistance is attributed to the region between the ohmic contact and the channel since transmission line method (TLM) test structures using the same source and drain implants on GaN witness pieces gave a value of the specific contact resistance of - l ~ l O - ~  a-cm (Zolper 1995). This access resistance can be substantially reduced by optimizing the source and drain implant conditions and by self-aligning these implants to the gate contact metal. A second possible cause of the low transconductance is low electron mobility in the implanted channel region. If this is the case, optimization of the implant activation process should lead to improved mobilities. In addition, optimization of the epitaxial GaN layers for maximum electron mobility, as has been done for epitaxial FETs, should result in improved JFET performance. At room temperature this device demonstrated a unity gain cut-off frequency of 2.7 GHz and a maximum oscillation frequency of 9.4 GHz. These frequency metrics are comparable to similar dimension epitaxial GaN MESFETs (Binari 1995). 2 0 5 10 15 20 25 v,, (VI FIG 3. Room temperature ID, versus V,, curves for the first GaN JFET (VGs starts fl at 0 V with -1 V steps). The JFET is 1.7 pm x 50 pm. Figure 4 shows the forward and reverse gate diode characteristics of a -1.7 pm x 50 pm GaN JFET between 25 and 175 "C. The diode demonstrates room a temperature (RT) gate turn-on voltage [VGS(On)] of 1.84 V at 1 mA/rnm of gate current. This voltage is roughly 55% of the bandgap of GaN (0.55Eg) which is slightly lower than that seen in GaAs JFETs where a gate turn-on voltage of 0.67Eg or -0.95 V at 1 mA/mm of gate current has been reported (Sherwin 1995). This reduction in VGS(0tI) can be explained if the W-gate contact is not completely ohmic and therefore causes band bending at the surface that will reduce the diode turn-on voltage as in a Shannon contact (Shannon 1972). This effect has been demonstrated in GaAs JFETs (Zolper 1994). This reduction in VGS(on) can be overcome by increasing the p-type doping level or by employing an improved gate contact scheme to the p-region. At 175 "C the gate diode's forward turn-on voltage decreases to 0.9 V while still displaying very good rectification characteristics but with an increase in the reverse leakage current. -10 -5 0 5 v, (V) FIG 4. Temperature dependence of IGs versus V,, of a 1.7 pm x 50 pm GaN JFET. The temperature starts at 25 "C and steps by 25 "C to 175 "C, Figure 5 shows I,, versus V,, curves for varying gate bias at temperatures of 25, 75 and 125 "C. The gate bias swing was limited to -5 to 0 V and the drain sweep was only taken to 15 V for these measurements to avoid catastrophic breakdown of the gate at elevated temperature. As seen in fig 5, the source/drain pinch-off and breakdown characteristics quickly degrade with increasing temperature. For V,, = -5 V and V,, = 15V, I,, increases from 1.3 mA at 25 OC, to 2.3 mA at 75 OC, and then dramatically to 6.7 mA at 125 "C where the start of enhanced breakdown is becoming evident. This phenomena may either be due to an increase in substrate conduction or defect assisted tunneling conduction of the gate diode in reverse bias. Reverse gate leakage alone does not explain the drain current seen in Fig 5c. From Fig 4 the gate current at -10 V and 125 "C is - 0.3 mA while the drain current in fig 5c at V,, = -5 V and V, = 5 V(an effective gate bias of -10 V) is -1 mA, Further work is needed to understand the mechanism, however, variable temperature Hall measurements on the starting GaN material shows temperature activated conduction with an estimated activation energy of 335 meV (Zolper 1996a). This may be due to compensating impurities in the MOCVD GaN. Therefore, although further study of the gate properties is needed, substrate conduction is certain to play a significant role in these fxst GaN JFETs at elevated temperature. O . * ' F T - T  lVsfePs _.._ ..... .... ( .......... ~ .......... _. CONCLUSION 8 0 5 10 15 5 10 15 0 5 10 15 v, (VI v, (V) v, (VI (a) (b) (c) FIG 5. ID, versus V,, for 1.7 pm x 60 pm GaN JFET for V,, starting at 0 V and stepping by -lV to -5V. The test temperatures are a) 25 "C, b) 75 'C ,  c) and 125 "C. Selective area ion implantation doping has been used to fabricatdthe first GaN JFETs. P-type and n-type doping was achieved with Ca- and Si-implantation, respectively, followed by a 1150 "C rapid thermal anneal. A refractory W gate contact was employed that allows the p-gate region to be self-aligned to the gate contact. This contact was in-place during the 1150 "C implant activation anneal and will therefore be extremely stable for lower temperature (-600 "C) device operation. Although the gate diode demonstrated good forward rectification properties to 175 OC, the JFET's pinch-off characteristics are markedly degraded even at 125 "C. At this point we attribute the temperature degradation to increased conduction in the GaN buffer. Although these first GaN JFETs do not display good high-temperature operation, the basic device structure with a self-aligned W gate contact, coupled with the attractive material properties of GaN, should perform well at high temperature once improved GaN buffer layers are employed. Acknowledpment; The authors gratefully acknowledge the excellent technical support of G. Lopez in J E T  processing at Sandia. The work performed at Sandia was supported by the DOE under contract #DE-AC04-94AL85000. The work at Hughes and was supported by ARO (Dr. J. M. Zavada). The work at UF is partially supported by a NSF grant (DMR-942 1109) and a University Research Initiative grant from ONR (N00014- 92-5-1895). The work at EMCORE was supported by BMDO-IST managed by M. Yoder at ONR. Peferenca Chow, T. P., and R. Tyagi (1994) IEEE Trans. Elec. Dev. 41,1481 (1994). Binari, S .  C., L. B. Rowland, W. Kruppa, G. Kelner, K. Doverspike, andD. K. Gaskill (1994) Elect. Lett. 30,1248 (1994). Binari, S .  C., L. B. Rowland, G. Kelner, W. Kruppa, H. B. Dietrick, K. Doverspike, and D. K. Gaskill (1995) in Proceedings of 1994 International Symposium on Cow. Semiconductors, San Diego, CA Sept. 1994 (Institute of Physics, Bnstol, UK, 1995) Khan, M. A., J. N. Kuznia, A. R. Bhattarai, and D. T. Olson (1993a) Appl. Phys. Lett. Khan, M. A,, A. Bhattarai, J. N. Kuznia, andD. T. Olson (1993b) Appl. Phys. Lett. 63, Morkq, H., S. Strite, G. B. Gao, M. E. Lin, B. Sverdlov, and M. Bums, (1994) J. Appl. Pearton, S .  J., C. B. Vartuli, J. C. Zolper, C. Yuan, R. A. Stall (1995) Appl. Phys. Lett. Shannon J. M. (1974) Appl. Phys. Lett. 25,75 (1974). Sherwin, M. E., J. C. Zolper, A. G. Baca, R. J. Shul, A. J. Howard, D. J. Rieger, J. F. Klem, and V. M. Hietala (1994) IEEE Elec. Dev. Lett. 15,242 (1994).Shul, R. J., A. J. Howard, S. J. Pearton, C. R. Abernathy, C. €3. Vartuli, P. A. Barnes, andP. Davies (1995) Conf. hoc. MRS, Fall 1995, symposium AAA (Material Research Society, Pittsburgh PA, in  press). Yuan, C., T. Salagaj, A. Gurary, P. Zawadzki, C. S .  Chern, W. Kroll, R. A. Stall, Y. Li, M. Schurman, C.-Y. Hwang, W. E. Mayo, Y. Lu, S .  J. Pearton, S .  Krishnankutty, and R. M. Kolbas (1995) J. Electrochem. Soc. 142, L163 (1995).Zipperian, T. E., (1986) Conference Proceedings PCI ‘86 (Intertex Communications, Ventura, CA, 1986) pp. pp. 492-496. 62, 1786 (1993). 12 1441993). Phys. 76,1363 (1994). 67, 1435 (1995). 353-365. Zipperian, T. E., (1986) Conference Proceedings PCI ‘86 (Intertex Communications, Zolper, J. C., A. G. Baca, R. J. Shul, A. J. Howard, D. J. Rieger, M. E. Sherwin, M. L. Ventura, CA, 1986) pp. 353-365. Lovejoy (1994a) H. P. Hjalmarson, B. L. Draper, J. F. Klem, and V. M. Hietala, IEEE Trans. Elec. Dev, 41, 1078 (1994). (1994b) IEEE Elec. Dev. Lett. 15,493 (1994). Zolper, J. C., M. E. Sherwin, A. G. Baca, R. J. Shul, J. F. Klem, and V. M. Hietala Zolper, J. C., M. Hagerott Crawford, S. J. Pearton, C. R. Abernathy, C. B. Vartuli, J. Ramer, S. D. Hersee, C. Yuan, and R. A. Stall, (1995) Conf. Proc. MRS, Fall 1995, symposium AAA (Material Research Society, Pittsburgh PA, in press). Zolper, J. C., R. G. Wilson, S .  J. Pearton, and R. A. Stall (1996a) “ Ca and 0 Implantation Doping of GaN,” Appl. Phys. Lett. 68, 1945 (1996). Zolper, J. C., R. J. Shul, A. G. Baca, R. G. Wilson, S. J. Pearton, and R. A. Stall (1996b) “Ion-Implanted GaN Junction Field Effect Transistor,” Appl. Phys. Lett. 68, 2273 (1996). 

Gallium nitride junction field effect transistors for high-temperature operation

https://digital.library.unt.edu/ark:/67531/metadc666706/m2/1/high_res_d/244677.pdf

Gallium nitride junction field effect transistors for high-temperature operation

Abstract

Similar works

Full text

Available Versions

UNT Digital Library