Kolozsvari, S.

Pesch, P.

Stüber, M.

Ulrich, S.

Ziebert, C.

English

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This R&D project is partially funded by the Federal Ministry for Education and Research (BMBF) within the framework „Research for the Production of tomorrow“; under the grant 02PU2000 and is supported by the Project Management Agency Research Center Karlsruhe (PTKA), branch office Dresden, in the field of production and manufacturing technologies (PFT).Technologiezentrum für Oberflächentechnik Rheinbreitbach GmbHSz. Kolozsvária)*, P. Pescha), C. Ziebertb), M. Stueberb), S. Ulrichb) a) TZO – Technologiezentrum für Oberflächentechnik Rheinbreitbach GmbH, Maarweg 30, 53619 Rheinbreitbach, Germanyb) Forschungszentrum Karlsruhe, Institut für Materialforschung I, Hermann-von-Helmholtz-Platz 1, 76344, Eggenstein-Leopoldshafen, Germany* Corresponding author, Tel.: +49 (0)2224 94 21 13; Fax: +49 (0)2224 94 21 20, E-mail adress: kolozsvari@tzo-gmbh.deSymposium B Poster SessionThursday 30th, April 2009Characterization of Binary, Ternary and Quaternary Hard Coatings in the Material System V-Al-C-N Produced by Industrial Scale Reactive Magnetron Sputter Depositionr t riz ti  f i r , r r   t r r  r  ti i  t  t ri l t  - l- -  r   I tri l l  ti  tr  tt r itiResults in dc-magnetron-sputtered binary VN-, VC-, ternary VAlN- and quaternary VAlCN-coatings:lt  i  - tr - tt r  i r  -, -, t r r  l -  t r r  l - ti :30 35 40 45 50 55 60 65 70050100150200250300  VN: N2/Ar ratio = 3:5  US = -170V     c-VN:   a=0.4137 nm; t=6 nm  Si(300)    VN(111)  VN(200)  Si(200)counts in arb. units2θ in °  Si(400)Results VN:• VN-coating nanocrystalline• average crystallite size ~6nm• near-stoichiometric• friction coefficient ~0.7 esults :• VN-coating nanocrystalline• average crystallite size ~6nm• near-stoichiometric• friction coefficient ~0.7 VN-coatings:- ti :VAlN-coatings VAlCN-coatingsl - ti l - ti Results and Outlook: lt   tl : -80-110-140-170-200Ubias in V2223253834Lc1250/150250/150250/150250/150250/150Ar:N2-ratio28302440250025603050HV0005Varied coating parameters Ar:N2 ratio and Ubias56,36V in at%43,186nmN in at%VN crystallitesize100/150150/150200/150250/150300/150Ar:N2-ratio 2.case250/200250/150250/100250/75250/50250/30Ar:N2-ratio 1.caseResults VC:• reactively deposited coatings are almost amorphous and show poor mechanical properties• sputtered coatings (V+C-targets) are nanocrystalline• average crystallite size ~3nm• friction coefficient variable through C-content (0.2-0.6)esults :• reactively deposited coatings are almost amorphous and show poor mechanical properties• sputtered coatings (V+C-targets) are nanocrystalline• average crystallite size ~3nm• friction coefficient variable through C-content (0.2-0.6)Results VAlN:• VAlN-coating nanocrystalline• average crystallite size ~4nm• near-stoichiometric• friction coefficient ~0.7• mechanical properties advantageousesults l :• VAlN-coating nanocrystalline• average crystallite size ~4nm• near-stoichiometric• friction coefficient ~0.7• mechanical properties advantageousResults V-Al-C-N:• C-content in VAlCN-layers has an impact on friction coefficient, see talk E3-2-7 on May, 1st by Dr. Ziebert• combination of hard, metastable materials with a low friction coefficient on an industrial machine manageable• first steps to understand the quaternary V-Al-C-N- layer-system through proceeding binary VN-, VC-, ternary VAlN- and quaternary VAlCN-systems are done• next steps: optimizing the VN-, VAlN- and VAlCN layer-systemsesults - l- - :• C-content in VAlCN-layers has an impact on friction coefficient, see talk E3-2-7 on May, 1st by Dr. Ziebert• combination of hard, metastable materials with a low friction coefficient on an industrial machine manageable• first steps to understand the quaternary V-Al-C-N- layer-system through proceeding binary VN-, VC-, ternary VAlN- and quaternary VAlCN-systems are done• next steps: optimizing the VN-, VAlN- and VAlCN layer-systemsDependence from critical load and hardness values on bias voltage XRD-spectra: VN crystallite structure of layer with best mechanical propertiesComposition measured by means of EPMA-methodVaried coating parameters are bias voltage, pressure (Ar:N2 ratio, 1. Ar-flow=const., 2. N2-flow=const.)Aim of the work: deposition of new coatings in the material system V-Al-C-N on industrial plants, to achieve metastable nanostructured hard layers through systematical variation of deposition parameters as power density, plasma pressure and variation of the partial pressure of process-gases (Ar:N2 and/or CH4) General approach:• binary coatings: VN, VC, AlN, (AlC) • ternary coatings VAlN, VCN, VAlC, AlCN• V-Al-C-N-coatingsr l r :• i r  c ti s: , , l , ( l ) • t r r  c ti s l , , l , l• - l- - - tiV-Al-C-NVN, VCAlN, AlCVAlN, VAlCVCN, AlCNFront doorRight doorLeft door rotatory tabledmax=400mmMagn. top leftMagn. top rigthMagn. bottom left Magn. bottom rightProcess  steps:• heating• etching• coating• cooling Flexible controlling: variation of many parameters in each process step possibleRealisation: dc magnetron-sputter industrial deposition system (CemeCon CC800/8) with rf processing mode (for 2 of 4 cathodes)VC-coatings:- ti :VC-coatings were deposited in two ways: both components V and C from solid state (targets) andreactive: V from solid state and C from CH4-gas. Varied coating parameters are Ar:CH4 flow-ratio and applied d.c. power on the C-Targets.-200-170-140-110-80Ubias in V at Ar:N2=250/150Dependence from hardness values on biasvoltageXRD-spectra: VAlN crystallite structure of layer with best mechanical properties20 30 40 50 60 70 80 90020406080100120140160VAlN(222) VAlNC(222)VAlNC(200)VAlN(200)  VAlNC-coating: Ar/N2/CH4 flow-ratio=250/150/0 mln   US = -110V     c-VAlNC:   a=0.415 nm; t=5 nm; ε=1.0x10-3; (111)-Tex=0.8  c-VAlN:   a=0.4 nm; t=10 nm; ε=1.0x10-3; (111)-Tex=0.55  Intensity (cps)2θ in °VAlN(111)VAlNC(111)  Si(400)VAlNC(220)VAlN(220)VAlNC(311)VAlN(311)VAlCN-coatings were deposited by combining VAlN and C-deposition30 35 40 45 50 55 60 65 70 75 800102030405060  VC-coating: A1-8082   CH4/Ar=60/250  US = -80V     c-VC:   a=0.4135 nm; t=1.5 nm; ε=1.0x10-3; (220)-Tex=5.0 (111)-Tex=1.2  Intensity (cps)2θ in °   Si(400)amorphousXRD-spectra of an amorphous  VC-layer, deposited by reactive sputtering from V-Target and Ar-CH4 gas mixture20 30 40 50 60 70 80 900102030405060708090100 V2C(113)      V2C(102)+(121) V2C(111)  VC-coating: A1-8179   Ar/N2/CH4=300/0/0 mln  US = -80V     c-VC:   a=0.416 nm; t=3 nm; ε=2.0x10-2; (200)-Tex=3.0  c-VC:   a=0.416 nm; t=3 nm; ε=2.0x10-2; (200)-Tex=3.0, (220)-Tex=5.0  VC(220)  Intensity (cps)2θ in °  VC(111)  VC(200)  Si(400)XRD-spectra of an V2C-layer, deposited by d.c. sputtering from V- and C- targets respectively20 30 40 50 60 70 800,00,10,20,30,40,50,60,70,80,91,0   Friction coefficient against CH4 flowFriction coefficientCH4 flow in sccmFriction coefficient against CH4 gas flow70 80 90 100 110 120 130 140 150 160 170 180 190 200 2100,00,10,20,30,40,50,60,70,80,91,0   Friction coefficient against bias voltage at 60sccm CH4-flow Friction coefficientBias voltage in VFriction coefficient against bias voltage at constant CH4 gas flowXRD-spectra of a VAlN-layer with a VAlCN toplayer

Characterization of binary, ternary and quaternary hard coatings in the material system V-Al-C-N produced by industrial scale reactive magnetron sputter deposition

https://publikationen.bibliothek.kit.edu/220075469/3815460

Characterization of binary, ternary and quaternary hard coatings in the material system V-Al-C-N produced by industrial scale reactive magnetron sputter deposition

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