Electrical deactivation and diffusion of boron in preamorphized ultrashallow junctions: interstitial transport and F co-implant control

Authors
Publication date
Publisher
'Institute of Electrical and Electronics Engineers (IEEE)'

Abstract

Abstract is not available.

    Similar works

    Full text

    thumbnail-image

    Available Versions

    Newcastle University E-Prints

    redirect
    oaioai:eprints.ncl.ac.uk:9216
    Last time updated on 30/05/2021