Low-Leakage ESD Power Supply Clamps in General Purpose 65 nm CMOS Technology

Electrostatic discharge (ESD) is a well-known contributor that reduces the reliability and yield of the integrated circuits (ICs). As ICs become more complex, they are increasingly susceptible to such failures due to the scaling of physical dimensions of devices and interconnect on a chip [1]. These failures are caused by excessive electric field and/or excessive current densities and result in the dielectric breakdown, electromigration of metal lines and contacts. ESD can affect the IC in its different life stages, from wafer fabrication process to failure in the field. Furthermore, ESD events can damage the integrated circuit permanently (hard failure), or cause a latent damage (soft failure) [2]. ESD protection circuits consisting of I/O protection and ESD power supply clamps are routinely used in ICs to protect them against ESD damage. The main objective of the ESD protection circuit is to provide a low-resistive discharge path between any two pins of the chip to harmlessly discharge ESD energy without damaging the sensitive circuits. The main target of this thesis is to design ESD power supply clamps that have the lowest possible leakage current without degrading the ESD protection ability in general purpose TSMC 65 nm CMOS technology. ESD clamps should have a very low-leakage current and should be stable and immune to the power supply noise under the normal operating conditions of the circuit core. Also, the ESD clamps must be able to handle high currents under an ESD event. All designs published in the general purpose 65 nm CMOS technology have used the SCR as the clamping element since the SCR has a higher current carrying capability compared to an MOS transistor of the same area [3]. The ESD power supply clamp should provide a low-resistive path in both directions to be able to deal with both PSD and NDS zapping modes. The SCR based design does not provide the best ESD protection for the NDS zapping mode (positive ESD stress at VSS with grounded VDD node) since it has two parasitic resistances (RNwell and RPsub) and one parasitic diode (the collector to base junction diode of the PNP transistor) in the path from the VSS to VDD. Furthermore, SCR-based designs are not suitable for application that exposed to hot switching or ionizing radiation [2]. In GP process, the gate oxide thickness of core transistors is reduced compared with LP process counterpart to achieve higher performance designs for high-frequency applications using 1 V core transistors and 2.5 V I/O option. The thinner gate oxide layer results in higher leakage current due to gate tunneling [4]. Therefore, using large thin oxide MOS transistors as clamping elements will result in a huge leakage. In this thesis, four power supply ESD clamps are proposed in which thick oxide MOS transistors are used as the main clamping element. Therefore, the low-leakage current feature is achieved without significantly degrading the ESD performance. In addition, the parasitic diode of the MOS transistors provides the protection against NSD-mode. In this thesis, two different ESD power supply clamp architectures are proposed: standalone ESD power supply clamps and hybrid ESD power supply clamps. Two standalone clamps are proposed: a transient PMOS based ESD clamp with thyristor delay element (PTC), and a static diode triggered power supply (DTC). The standalone clamps were designed to protect the circuit core against ±125 V CDM stress by limiting the voltage between the two power rails to less than the oxide breakdown voltage of the core transistors, BVOXESD = 5 V. The large area of this architecture was the price for maintaining the low-leakage current and an adequate ESD protection. The hybrid clamp architecture was proposed to provide a higher ESD protection, against ±300 V CDM stress, while reducing the layout area and maintaining the low-leakage feature. In the hybrid clamp structure, two clamps are connected in parallel between the two power supply rails, a static clamp, and a transient clamp. The static clamp triggers first and starts to sink the ESD energy and then an RC network triggers the primary transient clamp to sink most of the ESD stress. Two hybrid designs were proposed: PMOS ESD power supply clamp with thyristor delay element and diodes (PTDC), and NMOS ESD power supply clamp with level shifter delay element and diode (NLDC). Simulation results show that the proposed clamps are capable of protecting the circuit core against ±1.5 kV HBM and at least against ±125 V CDM stresses. The measurement results show that all of the proposed clamps are immune against false triggering, and transient induced latch-up. Furthermore, all four designs have responded favorably to the 4 V ESD-like pulse voltage under both chip powered and not powered conditions and after the stress ends the designs turned off. Finally, TLP measurement results show that all four proposed designs meet the minimum design requirement of the ESD protection circuit in the 65 nm CMOS technology (i.e. HBM protection level of ±1.5 kV )

Iddq testing of a CMOS 10-bit charge scaling digital-to-analog converter

This work presents an effective built-in current sensor (BICS), which has a very small impact on the performance of the circuit under test (CUT). The proposed BICS works in two-modes the normal mode and the test mode. In the normal mode the BICS is isolated from the CUT due to which there is no performance degradation of the CUT. In the testing mode, our BICS detects the abnormal current caused by permanent manufacturing defects. Further more our BICS can also distinguish the type of defect induced (Gate-source short, source-drain short and drain-gate short). Our BICS requires neither an external voltage source nor current source. Hence the BICS requires less area and is more efficient than the conventional current sensors. The circuit under test is a 10-bit digital to analog converter using charge-scaling architecture

High Temperature Electronics Design for Aero Engine Controls and Health Monitoring

There is a growing desire to install electronic power and control systems in high temperature harsh environments to improve the accuracy of critical measurements, reduce the amount of cabling and to eliminate cooling systems. Typical target applications include electronics for energy exploration, power generation and control systems. Technical topics presented in this book include:• High temperature electronics market• High temperature devices, materials and assembly processes• Design, manufacture and testing of multi-sensor data acquisition system for aero-engine control• Future applications for high temperature electronicsHigh Temperature Electronics Design for Aero Engine Controls and Health Monitoring contains details of state of the art design and manufacture of electronics targeted towards a high temperature aero-engine application. High Temperature Electronics Design for Aero Engine Controls and Health Monitoring is ideal for design, manufacturing and test personnel in the aerospace and other harsh environment industries as well as academic staff and master/research students in electronics engineering, materials science and aerospace engineering

Technology and layout-related testing of static random-access memories

Static random-access memories (SRAMs) exhibit faults that are electrical in nature. Functional and electrical testing are performed to diagnose faulty operation. These tests are usually designed from simple fault models that describe the chip interface behavior without a thorough analysis of the chip layout and technology. However, there are certain technology and layout-related defects that are internal to the chip and are mostly time-dependent in nature. The resulting failures may or may not seriously degrade the input/output interface behavior. They may show up as electrical faults (such as a slow access fault) and/or functional faults (such as a pattern sensitive fault). However, these faults cannot be described properly with the functional fault models because these models do not take timing into account. Also, electrical fault models that describe merely the input/output interface behavior are inadequate to characterize every possible defect in the basic SRAM cell. Examples of faults produced by these defects are: (a) static data loss, (b) abnormally high currents drawn from the power supply, etc. Generating tests for such faults often requires a thorough understanding and analysis of the circuit technology and layout. In this article, we shall examine ways to characterize and test such faults. We shall divide such faults into two categories depending on the types of SRAMs they effect—silicon SRAMs and GaAs SRAMs.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/43015/1/10836_2004_Article_BF00972519.pd

[Delta] IDDQ testing of a CMOS 12-bit charge scaling digital-to-analog converter

This work presents design, implementation and test of a built-in current sensor (BICS) for ∆IDDQ testing of a CMOS 12-bit charge scaling digital-to-analog converter (DAC). The sensor uses power discharge method for the fault detection. The sensor operates in two modes, the test mode and the normal mode. In the test mode, the BICS is connected to the circuit under test (CUT) which is DAC and detects abnormal currents caused by manufacturing defects. In the normal mode, BICS is isolated from the CUT. The BICS is integrated with the DAC and is implemented in a 0.5 μm n-well CMOS technology. The DAC uses charge scaling method for the design and a low voltage (0 to 2.5 V) folded cascode op-amp. The built-in current sensor (BICS) has a resolution of 0.5 μA. Faults have been introduced into DAC using fault injection transistors (FITs). The method of ∆IDDQ testing has been verified both from simulation and experimental measurements

The Fifth NASA Symposium on VLSI Design

The fifth annual NASA Symposium on VLSI Design had 13 sessions including Radiation Effects, Architectures, Mixed Signal, Design Techniques, Fault Testing, Synthesis, Signal Processing, and other Featured Presentations. The symposium provides insights into developments in VLSI and digital systems which can be used to increase data systems performance. The presentations share insights into next generation advances that will serve as a basis for future VLSI design

Product assurance technology for custom LSI/VLSI electronics

The technology for obtaining custom integrated circuits from CMOS-bulk silicon foundries using a universal set of layout rules is presented. The technical efforts were guided by the requirement to develop a 3 micron CMOS test chip for the Combined Release and Radiation Effects Satellite (CRRES). This chip contains both analog and digital circuits. The development employed all the elements required to obtain custom circuits from silicon foundries, including circuit design, foundry interfacing, circuit test, and circuit qualification