4,091 research outputs found
Microstructure of the deep level defect E1/E2 in 6H silicon carbide (Abstract)
published_or_final_versio
Deep level transient spectroscopy study of particle irradiation induced defects in n-6H-SiC (Abstract)
published_or_final_versio
Improved performance by using TaON/SiO2 as dual tunnel layer in Charge-Trapping nonvolatile memory
postprin
Nature of the acceptor responsible for p-type conduction in liquid encapsulated Czochralski-grown undoped gallium antimonide
The acceptors in undoped liquid encapsulated Czochralski (LEC)-grown GaSb were investigated using temperature dependent Hall (TDH) and positron lifetime spectroscopy measurements. TDH measurements were performed on nonirradiated and electron irradiated undoped samples. The 34 meV acceptor was found to be the important one responsible for the p-type conduction in nonirradiated and the e--irradiated undoped materials annealed at temperatures up to 500°C. This acceptor was not related to any VGa-related defect detected and was most likely the GaSb antisite.published_or_final_versio
Spatial distribution of carrier concentration in un-doped GaN film grown on sapphire (Abstract)
published_or_final_versio
Acceptors in undoped gallium antimonide
Undoped GaSb materials were studied by temperature dependent Hall (TDH) measurements and photoluminescence (PL). The TDH data reveals four acceptor levels (having ionization energies of 7meV, 32meV, 89meV and 123meV) in the as-grown undoped GaSb samples. The 32meV and the 89meV levels were attributed to the GaSb defect and the VGa-related defect. The Ga Sb defect was found to be the important acceptor responsible for the p-type nature of the present undoped GaSb samples because of its abundance and its low ionization energy. This defect was thermally stable after the 500°C annealing. Similar to the non-irradiated samples, the 777meV and the 800meV PL signals were also observed in the electron irradiated undoped GaSb samples. The decrease of the two peaks' intensities with respect to the electron irradiation dosage reveals the introduction of a non-radiative defect during the electron irradiation process, which competes with the transition responsible for the 777meV and the 800meV PL peaks.published_or_final_versio
A quantitative link between microplastic instability and macroscopic deformation behaviors in metallic glasses
2009-2010 > Academic research: refereed > Publication in refereed journalVersion of RecordPublishe
Experimental study and modeling of the influence of screw dislocations on the performance of Au/n-GaN Schottky diodes
The influence of screw dislocations on the performance of Au/n-GaN Schottky diodes was investigated. The current-voltage (I-V) characteristics of the diodes fabricated on different GaN templates grown by metallorganic chemical vapor deposition on sapphire substrates were studied. It was shown that these dislocations result in the lowering of the barrier height in the localized regions.published_or_final_versio
Effects of annealing on the electrical properties of Fe-doped InP
The electrical properties of Fe-doped semi-insulating (SI) InP were investigated before and after annealing. The annealing conditions were controlled by changing either the temperature or duration. Correlation between the change of electrical parameters with the change of defect concentration at different annealing stage was observed. The defects and the change of the concentrations in Fe-doped SI InP were detected by room-temperature photocurrent spectroscopy.published_or_final_versio
Deep-level defects in n-type 6H silicon carbide induced by He implantation
Defects in He-implanted n -type 6H-SiC samples have been studied with deep-level transient spectroscopy. A deep-level defect was identified by an intensity with a logarithmical dependence on the filling pulse width, which is characteristic of dislocation defects. Combined with information extracted from positron-annihilation spectroscopic measurements, this defect was associated with the defect vacancy bound to a dislocation. Defect levels at 0.380.44 eV (E1 E2), 0.50, 0.53, and 0.640.75 eV (Z1 Z2) were also induced by He implantation. Annealing studies on these samples were also performed and the results were compared with those obtained from e- -irradiated (0.3 and 1.7 MeV) and neutron-irradiated n -type 6H-SiC samples. The E1 E2 and the Z1 Z2 signals found in the He-implanted sample are more thermally stable than those found in the electron-irradiated or the neutron-irradiated samples. © 2005 American Institute of Physics.published_or_final_versio
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