7 research outputs found
Synthesis and Magnetic Properties of (V1−x Cr x )BO3 (0≦x≦0.5) with Calcite Structure
- Publication venue
- 'Springer Science and Business Media LLC'
- Publication date
- 01/01/1982
- Field of study
No full textIntroduction
- Author
- Publication venue
- 'Springer Science and Business Media LLC'
- Publication date
- 01/01/1971
- Field of study
No full textSilicon Nitride-Silicon Dioxide Combinations
- Author
- Publication venue
- 'Springer Science and Business Media LLC'
- Publication date
- 01/01/1971
- Field of study
No full textMechanism of reaction of silica and carbon for producing silicon carbide
- Author
- Publication venue
- 'SAGE Publications'
- Publication date
- Field of study
No full textStructural Analysis and Dielectric Properties of HoFe1−x Ni x O3 (0 ≤ x ≤ 0.5)
- Author
- B Raveau
- CG Koops
- D Adler
- D Treves
- D Treves
- DG Eorgiev
- E Anastassakis
- E Blechschmidt
- E Traversa
- FW Brockman
- G Moltgen
- H Forestier
- H Guo
- H Ritcher
- HC Gupta
- IH Campbell
- JB Torrance
- JC Maxwell
- JG Bednorz
- JH Park
- JS Zhou
- K Manoj Singh
- K. Asokan
- KK Patankar
- KK Patankar
- Kowsar Majid
- KW Wagner
- LL Hench
- LL Hench
- M Bhat
- M Eibschutz
- M. Ikram
- MA Hitti El
- MN Iliev
- NC Tombs
- R Gelmont von
- R Kumar
- R Kumar
- R Loudon
- R Mahindiran
- RA Waldron
- RC Craw Le
- RGW Brown
- RL White
- RM Bozorth
- RM Bozorth
- RS Devan
- S Geller
- S Geller
- S Venugopalan
- S Venugopalan
- SA Lokare
- T Yamaguchi
- X Granados
- Y Zhi
- Zubida Habib
- Publication venue
- 'Springer Science and Business Media LLC'
- Publication date
- Field of study
No full textIn situ high-temperature electron microscopy of 3DOM cobalt, iron oxide, and nickel
- Author
- A Blanco
- A Stein
- AN Baranov
- Andreas Stein
- AW Hull
- AW Hull
- B Phillips
- BT Holland
- BT Holland
- C Xiao
- C. Barry Carter
- CB Carter
- CF Blanford
- CF Blanford
- Christopher F. Blanford
- DA Moncrieff
- DB Williams
- DC Presnall
- DM Mittleman
- E Yablonovitch
- F Caruso
- G Subramania
- GD Hibbard
- H Fjellvag
- H Sawada
- H van Bekkum
- H Yan
- H Yan
- H Yan
- J Cazaux
- J Lee
- J Rieger
- JC Lytle
- JD Joannopoulos
- JEGJ Wijnhoven
- JG Lee
- JJ Host
- JS Beck
- JS King
- JW Goodwin
- JW Goodwin
- KSW Sing
- LS Darken
- M Megens
- M Setoyama
- MR Yang
- N Meller
- NA Clark
- NC Tombs
- OD Velev
- P Meredith
- P Zeng
- PL Gai
- PL Gai
- Q Huo
- R Yoshida
- RC Schroden
- RC Schroden
- RT Grimley
- RV Siriwardane
- S John
- S Sasaki
- SM Zhu
- T Akita
- T Kamino
- T Tanrisever
- W Luck
- WL Vos
- WL Vos
- Publication venue
- 'Springer Science and Business Media LLC'
- Publication date
- Field of study
No full textProperties
- Author
- A Coleman
- C Feldman
- Collet M.G. Depositing Silicon Nitride Layers at Low Temperatures Using a Photochemical Reaction. Electrochem. SOC.
- Cordes l.f. Evidence of excess silicon in reactively sputtered silicon nitride films
- CR Barnes
- DA Hardie
- Doo v.y. And d.r.Kerr. Investigation of refractory dielectrics for integrated circuits. International business machines corp., cambridge, mass. Nasa-cr-995. Contract no. Nas 12-105
- Drum c.m. And M.J. Rand. Chemical vapor deposition of a low-stress insulating film on silicon. Paper presented at 1968 electrochemical society meeting
- E Elliott
- E Feist
- E Kendall
- E Newman
- E Turkdogan
- EJM Kendall
- Gregor l.v. Study of silicon nitride as a dielectric material for microelectronic applications
- Gyulai j. Et al. Analysis of silicon nitride layers on silicon by back-scattering and channeling effect measurements
- JR Szedon
- k Bean
- Kendall e.j.m. Trapping levels in the silicon-silicon nitride system
- LN Aleksandrov
- N Parr
- NC Tombs
- PA Popper
- PS Schaffer
- S Yamazaki
- SM Hu
- SMT Sze
- Tokuyama t. Et al. Thermal expansion coefficient of a pyrolytically deposited silicon nitride film. Japan. J. Of appl. Phys., v. 6, no. 10
- Transetch-n-selective etchant for silicon nitride films. Transene company inc., newburyport turnpike, route 1, rowley, mass
- VY Doo
- VY Doo
- WM Wells
- Y Kuwano
- Publication venue
- 'Springer Science and Business Media LLC'
- Publication date
- 01/01/1971
- Field of study
No full text
