Formation polarity dependent improved resistive switching memory characteristics using nanoscale (1.3 nm) core-shell IrOx nano-dots

Improved resistive switching memory characteristics by controlling the formation polarity in an IrOx/Al2O3/IrOx-ND/Al2O3/WOx/W structure have been investigated. High density of 1 × 1013/cm2 and small size of 1.3 nm in diameter of the IrOx nano-dots (NDs) have been observed by high-resolution transmission electron microscopy. The IrOx-NDs, Al2O3, and WOx layers are confirmed by X-ray photo-electron spectroscopy. Capacitance-voltage hysteresis characteristics show higher charge-trapping density in the IrOx-ND memory as compared to the pure Al2O3 devices. This suggests that the IrOx-ND device has more defect sites than that of the pure Al2O3 devices. Stable resistive switching characteristics under positive formation polarity on the IrOx electrode are observed, and the conducting filament is controlled by oxygen ion migration toward the Al2O3/IrOx top electrode interface. The switching mechanism is explained schematically based on our resistive switching parameters. The resistive switching random access memory (ReRAM) devices under positive formation polarity have an applicable resistance ratio of > 10 after extrapolation of 10 years data retention at 85°C and a long read endurance of 105 cycles. A large memory size of > 60 Tbit/sq in. can be realized in future for ReRAM device application. This study is not only important for improving the resistive switching memory performance but also help design other nanoscale high-density nonvolatile memory in future

Dopamine-Sensing Characteristics and Mechanism by Using N2/O2 Annealing in Pt/Ti/n-Si Structure

Dopamine detection by using N2/O2 annealing in a Pt/Ti/n-Si structure is investigated for the first time. To achieve repeatable and stable dopamine detection, a Pt membrane is annealed at elevated temperatures of 500 to 700 °C. N2/O2 gas ambient is used to optimize the membrane. The Pt membrane with thicknesses from 5 to 2 nm is optimized. Novel Pt/Ti/n-Si Schottky contact in a metal–electrolyte–membrane–silicon (MEMS) structure detects dopamine with a low concentration of 1 pM. The Pt membrane with N2 ambient annealing shows the lowest concentration of dopamine sensing with a small volume of 10 µL, acceptable stability, and repeatability. Scan rate-dependent dopamine concentration sensing is also investigated in the two-terminal measurement method. This study is useful for the early diagnosis of Parkinson’s disease in the near future

Switching Characteristics and Mechanism Using Al2O3 Interfacial Layer in Al/Cu/GdOx/Al2O3/TiN Memristor

Resistive switching characteristics by using the Al2O3 interfacial layer in an Al/Cu/GdOx/Al2O3/TiN memristor have been enhanced as compared to the Al/Cu/GdOx/TiN structure owing to the insertion of Al2O3 layer for the first time. Polycrystalline grain, chemical composition, and surface roughness of defective GdOx film have been investigated by transmission electron microscope (TEM), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and atomic force microscopy (AFM). For bipolar resistive switching (BRS) characteristics, the conduction mechanism of high resistance state (HRS) is a space-charge limited current for the Al/Cu/GdOx/TiN device while the Al/Cu/GdOx/Al2O3/TiN device shows Schottky emission. However, both devices show Ohmic at a low resistance state (LRS). After the device has been SET, the Cu filament evidences by both TEM and elemental mapping. Oxygen-rich at the Cu/GdOx interface and Al2O3 layer are confirmed by energy dispersive X-ray spectroscopy (EDS) line profile. The Al/Cu/GdOx/Al2O3/TiN memristor has lower RESET current, higher speed operation of 100 ns, long read pulse endurance of >109 cycles, good data retention, and the memristor with a large resistance ratio of >105 is operated at a low current of 1.5 µA. The complementary resistive switching (CRS) characteristics of the Al/Cu/GdOx/Al2O3/TiN memristor show also a low current operation as compared to the Al/Cu/GdOx/TiN device (300 µA vs. 3.1 mA). The transport mechanism is the Cu ion migration and it shows Ohmic at low field and hopping at high field regions. A larger hopping distance of 1.82 nm at the Cu/GdOx interface is obtained as compared to a hopping distance of 1.14 nm in the Al2O3 layer owing to a larger Cu filament length at the Cu/GdOx interface than the Al2O3 layer. Similarly, the CRS mechanism is explained by using the schematic model. The CRS characteristics show a stable state with long endurance of >1000 cycles at a pulse width of 1 µs owing to the insertion of Al2O3 interfacial layer in the Al/Cu/GdOx/Al2O3/TiN structure

Dopamine-Sensing Characteristics and Mechanism by Using N₂/O₂ Annealing in Pt/Ti/n-Si Structure

Dopamine detection by using N2/O2 annealing in a Pt/Ti/n-Si structure is investigated for the first time. To achieve repeatable and stable dopamine detection, a Pt membrane is annealed at elevated temperatures of 500 to 700 °C. N2/O2 gas ambient is used to optimize the membrane. The Pt membrane with thicknesses from 5 to 2 nm is optimized. Novel Pt/Ti/n-Si Schottky contact in a metal–electrolyte–membrane–silicon (MEMS) structure detects dopamine with a low concentration of 1 pM. The Pt membrane with N2 ambient annealing shows the lowest concentration of dopamine sensing with a small volume of 10 µL, acceptable stability, and repeatability. Scan rate-dependent dopamine concentration sensing is also investigated in the two-terminal measurement method. This study is useful for the early diagnosis of Parkinson’s disease in the near future