11 research outputs found

    Broadband SNAIL parametric amplifier with microstrip impedance transformer

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    Josephson parametric amplifiers have emerged as a promising platform for quantum information processing and squeezed quantum states generation. Travelling wave and impedance-matched parametric amplifiers provide broad bandwidth for high-fidelity single-shot readout of multiple qubit superconducting circuits. Here, we present a quantum-limited 3-wave-mixing parametric amplifier based on superconducting nonlinear asymmetric inductive elements (SNAILs), whose useful bandwidth is enhanced with an on-chip two-section impedance-matching circuit based on microstrip transmission lines. The amplifier dynamic range is increased using an array of sixty-seven SNAILs with 268 Josephson junctions, forming a nonlinear quarter-wave resonator. Operating in a current-pumped mode, we experimentally demonstrate an average gain of 17dB17 dB across 300MHz300 MHz bandwidth, along with an average saturation power of βˆ’100dBm- 100 dBm, which can go as high as βˆ’97dBm- 97 dBm with quantum-limited noise performance. Moreover, the amplifier can be fabricated using a simple technology with just a one e-beam lithography step. Its central frequency is tuned over a several hundred megahertz, which in turn broadens the effective operational bandwidth to around 1.5GHz1.5 GHz.Comment: 7 pages, 3 figure

    High-Q trenched aluminum coplanar resonators with an ultrasonic edge microcutting for superconducting quantum devices

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    Dielectric losses are one of the key factors limiting the coherence of superconducting qubits. The impact of materials and fabrication steps on dielectric losses can be evaluated using coplanar waveguide (CPW) microwave resonators. Here, we report on superconducting CPW microwave resonators with internal quality factors systematically exceeding 5x106 at high powers and 2x106 (with the best value of 4.4x106) at low power. Such performance is demonstrated for 100-nm-thick aluminum resonators with 7-10.5 um center trace on high-resistivity silicon substrates commonly used in quantum Josephson junction circuits. We investigate internal quality factors of the resonators with both dry and wet aluminum etching, as well as deep and isotropic reactive ion etching of silicon substrate. Josephson junction compatible CPW resonators fabrication process with both airbridges and silicon substrate etching is proposed. Finally, we demonstrate the effect of airbridges positions and extra process steps on the overall dielectric losses. The best quality fa ctors are obtained for the wet etched aluminum resonators and isotropically removed substrate with the proposed ultrasonic metal edge microcutting.Comment: 6 pages, 2 figure

    Π­Ρ„Ρ„Π΅ΠΊΡ‚ΠΈΠ²Π½ΠΎΡΡ‚ΡŒ примСнСния ΠΌΠΎΠ΄ΠΈΡ„ΠΈΠΊΠ°Ρ†ΠΈΠΉ ΠΏΡ€Π΅ΠΏΠ°Ρ€Π°Ρ‚Π° БупСрстим Π² ΠΌΠ°Π»Ρ‹Ρ… Π΄ΠΎΠ·Π°Ρ… Π½Π° этапС Π°Π΄Π°ΠΏΡ‚Π°Ρ†ΠΈΠΈ микрорастСний Тимолости (Lonicera L.) подсСкции синСй (Caeruleae Rehd.) ΠΊ Π½Π΅ΡΡ‚Π΅Ρ€ΠΈΠ»ΡŒΠ½Ρ‹ΠΌ условиям с ΡƒΡ‡Π΅Ρ‚ΠΎΠΌ послСдСйствия Π½Π° этапС доращивания

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    Relevance. In recent years, interest in the edible honeysuckle culture has increased in Russia, the wide distribution of which is hampered by the lack of quality planting material. The technology of clonal micropropagation allows for a short time to obtain a large amount of honeysuckle planting material, more than a thousand regenerated plants per year from one meristematic apex introduced into an in vitro culture. It is hundreds of times more than in traditional methods of vegetative propagation. Adaptation to non-sterile conditions is the final and most crucial stage of clonal micropropagation, the loss of which can be from 50 to 90%. It should be noted that there is practically no research on how the further development of adapted honeysuckle plants takes place during subsequent growing.Methods. Researching of growth regulators of the new generation Superstim 1 and Superstim 2 effect in low and ultra-low doses on the survival rates and development of honeysuckle plants at the stages of adaptation subsequent growing.Results. Superstim 1 is more effective at physiological concentrations – 1 x 10-7 and in the field of ultra-low doses – 1 x 10-14, 1 x 10-15%. At the stage of subsequent growing, a positive after-effect of physiological concentrations – 1x10-3 and 1x10-7 was observed, and an ultra-low dose – 1x10-17%. The growth regulator Superstim 2 at the stages of adaptation and subsequent growing is effectively used only in one concentration – 1x10-16%. The additional foliar treatments at the stage of subsequent growing are not necessary.Β ΠΠΊΡ‚ΡƒΠ°Π»ΡŒΠ½ΠΎΡΡ‚ΡŒ. Π’ послСдниС Π³ΠΎΠ΄Ρ‹ Π² России увСличиваСтся интСрСс ΠΊ ΠΊΡƒΠ»ΡŒΡ‚ΡƒΡ€Π΅ Тимолости съСдобной, ΡˆΠΈΡ€ΠΎΠΊΠΎΠ΅ распространСниС ΠΊΠΎΡ‚ΠΎΡ€ΠΎΠΉ сдСрТиваСтся ΠΈΠ·-Π·Π° Π΄Π΅Ρ„ΠΈΡ†ΠΈΡ‚Π° качСствСнного посадочного ΠΌΠ°Ρ‚Π΅Ρ€ΠΈΠ°Π»Π°. ВСхнология клонального микроразмноТСния позволяСт Π·Π° ΠΊΠΎΡ€ΠΎΡ‚ΠΊΠΈΠΉ срок ΠΏΠΎΠ»ΡƒΡ‡ΠΈΡ‚ΡŒ большоС количСство посадочного ΠΌΠ°Ρ‚Π΅Ρ€ΠΈΠ°Π»Π° Тимолости, Π±ΠΎΠ»Π΅Π΅ тысячи растСний-Ρ€Π΅Π³Π΅Π½Π΅Ρ€Π°Π½Ρ‚ΠΎΠ² Π² Π³ΠΎΠ΄ ΠΈΠ· ΠΎΠ΄Π½ΠΎΠ³ΠΎ Π²Π²Π΅Π΄Π΅Π½Π½ΠΎΠ³ΠΎ Π² ΠΊΡƒΠ»ΡŒΡ‚ΡƒΡ€Ρƒ in vitro мСристСматичСского апСкса, Ρ‡Ρ‚ΠΎ Π² сотни Ρ€Π°Π· большС, Ρ‡Π΅ΠΌ ΠΏΡ€ΠΈ использовании Ρ‚Ρ€Π°Π΄ΠΈΡ†ΠΈΠΎΠ½Π½Ρ‹Ρ… ΠΌΠ΅Ρ‚ΠΎΠ΄ΠΎΠ² Π²Π΅Π³Π΅Ρ‚Π°Ρ‚ΠΈΠ²Π½ΠΎΠ³ΠΎ размноТСния. Адаптация ΠΊ Π½Π΅ΡΡ‚Π΅Ρ€ΠΈΠ»ΡŒΠ½Ρ‹ΠΌ условиям являСтся Π·Π°ΠΊΠ»ΡŽΡ‡ΠΈΡ‚Π΅Π»ΡŒΠ½Ρ‹ΠΌ ΠΈ Π½Π°ΠΈΠ±ΠΎΠ»Π΅Π΅ отвСтствСнным этапом клонального микроразмноТСния, ΠΏΠΎΡ‚Π΅Ρ€ΠΈ Π½Π° ΠΊΠΎΡ‚ΠΎΡ€ΠΎΠΌ ΠΌΠΎΠ³ΡƒΡ‚ ΡΠΎΡΡ‚Π°Π²Π»ΡΡ‚ΡŒ ΠΎΡ‚ 50 Π΄ΠΎ 90% ΠΌΠ΅Ρ€ΠΈΠΊΠ»ΠΎΠ½ΠΎΠ². Π‘Π»Π΅Π΄ΡƒΠ΅Ρ‚ ΠΎΡ‚ΠΌΠ΅Ρ‚ΠΈΡ‚ΡŒ, Ρ‡Ρ‚ΠΎ практичСски Π½Π΅Ρ‚ исслСдований ΠΎ Ρ‚ΠΎΠΌ, ΠΊΠ°ΠΊΠΈΠΌ ΠΎΠ±Ρ€Π°Π·ΠΎΠΌ происходит дальнСйшСС Ρ€Π°Π·Π²ΠΈΡ‚ΠΈΠ΅ Π°Π΄Π°ΠΏΡ‚ΠΈΡ€ΠΎΠ²Π°Π½Π½Ρ‹Ρ… растСний Тимолости ΠΏΡ€ΠΈ Π΄ΠΎΡ€Π°Ρ‰ΠΈΠ²Π°Π½ΠΈΠΈ.ΠœΠ΅Ρ‚ΠΎΠ΄ΠΈΠΊΠ°. ΠŸΡ€ΠΎΠ²Π΅Π΄Π΅Π½ΠΎ ΠΈΠ·ΡƒΡ‡Π΅Π½ΠΈΠ΅ влияния ΠΏΡ€Π΅ΠΏΠ°Ρ€Π°Ρ‚ΠΎΠ² Π½ΠΎΠ²ΠΎΠ³ΠΎ поколСния БупСрстим 1 ΠΈ БупСрстим 2 Π² ΠΌΠ°Π»Ρ‹Ρ… ΠΈ свСрхмалых Π΄ΠΎΠ·Π°Ρ… Π½Π° ΠΏΠΎΠΊΠ°Π·Π°Ρ‚Π΅Π»ΠΈ приТиваСмости ΠΈ развития растСний Тимолости Π½Π° этапах Π°Π΄Π°ΠΏΡ‚Π°Ρ†ΠΈΠΈ ΠΈ доращивания.Π Π΅Π·ΡƒΠ»ΡŒΡ‚Π°Ρ‚Ρ‹. ВыявлСно, Ρ‡Ρ‚ΠΎ ΠΏΡ€Π΅ΠΏΠ°Ρ€Π°Ρ‚ БупСрстим 1 Π±ΠΎΠ»Π΅Π΅ эффСктивСн Π² физиологичСской ΠΊΠΎΠ½Ρ†Π΅Π½Ρ‚Ρ€Π°Ρ†ΠΈΠΈ – 1x10-7% ΠΈ Π² области свСрхмалых Π΄ΠΎΠ· – 1x10-14, 1x10-15%. На этапС доращивания выявлСно ΠΏΠΎΠ»ΠΎΠΆΠΈΡ‚Π΅Π»ΡŒΠ½ΠΎΠ΅ послСдСйствиС физиологичСских ΠΊΠΎΠ½Ρ†Π΅Π½Ρ‚Ρ€Π°Ρ†ΠΈΠΉ – 1x10-3, 1x10-7%, ΠΈ свСрхмалой Π΄ΠΎΠ·Ρ‹ – 1x10-17%. ΠŸΡ€Π΅ΠΏΠ°Ρ€Π°Ρ‚ БупСрстим 2 Π½Π° этапах Π°Π΄Π°ΠΏΡ‚Π°Ρ†ΠΈΠΈ ΠΈ доращивания эффСктивно ΠΏΡ€ΠΈΠΌΠ΅Π½ΡΡ‚ΡŒ Ρ‚ΠΎΠ»ΡŒΠΊΠΎ Π² ΠΎΠ΄Π½ΠΎΠΉ ΠΊΠΎΠ½Ρ†Π΅Π½Ρ‚Ρ€Π°Ρ†ΠΈΠΈ – 1x10-16%. Π’ Π΄ΠΎΠΏΠΎΠ»Π½ΠΈΡ‚Π΅Π»ΡŒΠ½Ρ‹Ρ… Π½Π΅ΠΊΠΎΡ€Π½Π΅Π²Ρ‹Ρ… ΠΎΠ±Ρ€Π°Π±ΠΎΡ‚ΠΊΠ°Ρ… Π½Π° этапС доращивания Π½Π΅Ρ‚ нСобходимости.

    High-Q trenched aluminum coplanar resonators with an ultrasonic edge microcutting for superconducting quantum devices

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    Abstract Dielectric losses are one of the key factors limiting the coherence of superconducting qubits. The impact of materials and fabrication steps on dielectric losses can be evaluated using coplanar waveguide (CPW) microwave resonators. Here, we report on superconducting CPW microwave resonators with internal quality factors systematically exceeding 5 × 106 at high powers and 2 × 106 (with the best value of 4.4 × 106) at low power. Such performance is demonstrated for 100-nm-thick aluminum resonators with 7–10.5 um center trace on high-resistivity silicon substrates commonly used in Josephson-junction based quantum circuit. We investigate internal quality factors of the resonators with both dry and wet aluminum etching, as well as deep and isotropic reactive ion etching of silicon substrate. Josephson junction compatible CPW resonators fabrication process with both airbridges and silicon substrate etching is proposed. Finally, we demonstrate the effect of airbridges’ positions and extra process steps on the overall dielectric losses. The best quality factors are obtained for the wet etched aluminum resonators and isotropically removed substrate with the proposed ultrasonic metal edge microcutting
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