11 research outputs found
Broadband SNAIL parametric amplifier with microstrip impedance transformer
Josephson parametric amplifiers have emerged as a promising platform for
quantum information processing and squeezed quantum states generation.
Travelling wave and impedance-matched parametric amplifiers provide broad
bandwidth for high-fidelity single-shot readout of multiple qubit
superconducting circuits. Here, we present a quantum-limited 3-wave-mixing
parametric amplifier based on superconducting nonlinear asymmetric inductive
elements (SNAILs), whose useful bandwidth is enhanced with an on-chip
two-section impedance-matching circuit based on microstrip transmission lines.
The amplifier dynamic range is increased using an array of sixty-seven SNAILs
with 268 Josephson junctions, forming a nonlinear quarter-wave resonator.
Operating in a current-pumped mode, we experimentally demonstrate an average
gain of across bandwidth, along with an average saturation
power of , which can go as high as with quantum-limited
noise performance. Moreover, the amplifier can be fabricated using a simple
technology with just a one e-beam lithography step. Its central frequency is
tuned over a several hundred megahertz, which in turn broadens the effective
operational bandwidth to around .Comment: 7 pages, 3 figure
High-Q trenched aluminum coplanar resonators with an ultrasonic edge microcutting for superconducting quantum devices
Dielectric losses are one of the key factors limiting the coherence of
superconducting qubits. The impact of materials and fabrication steps on
dielectric losses can be evaluated using coplanar waveguide (CPW) microwave
resonators. Here, we report on superconducting CPW microwave resonators with
internal quality factors systematically exceeding 5x106 at high powers and
2x106 (with the best value of 4.4x106) at low power. Such performance is
demonstrated for 100-nm-thick aluminum resonators with 7-10.5 um center trace
on high-resistivity silicon substrates commonly used in quantum Josephson
junction circuits. We investigate internal quality factors of the resonators
with both dry and wet aluminum etching, as well as deep and isotropic reactive
ion etching of silicon substrate. Josephson junction compatible CPW resonators
fabrication process with both airbridges and silicon substrate etching is
proposed. Finally, we demonstrate the effect of airbridges positions and extra
process steps on the overall dielectric losses. The best quality fa ctors are
obtained for the wet etched aluminum resonators and isotropically removed
substrate with the proposed ultrasonic metal edge microcutting.Comment: 6 pages, 2 figure
ΠΡΡΠ΅ΠΊΡΠΈΠ²Π½ΠΎΡΡΡ ΠΏΡΠΈΠΌΠ΅Π½Π΅Π½ΠΈΡ ΠΌΠΎΠ΄ΠΈΡΠΈΠΊΠ°ΡΠΈΠΉ ΠΏΡΠ΅ΠΏΠ°ΡΠ°ΡΠ° Π‘ΡΠΏΠ΅ΡΡΡΠΈΠΌ Π² ΠΌΠ°Π»ΡΡ Π΄ΠΎΠ·Π°Ρ Π½Π° ΡΡΠ°ΠΏΠ΅ Π°Π΄Π°ΠΏΡΠ°ΡΠΈΠΈ ΠΌΠΈΠΊΡΠΎΡΠ°ΡΡΠ΅Π½ΠΈΠΉ ΠΆΠΈΠΌΠΎΠ»ΠΎΡΡΠΈ (Lonicera L.) ΠΏΠΎΠ΄ΡΠ΅ΠΊΡΠΈΠΈ ΡΠΈΠ½Π΅ΠΉ (Caeruleae Rehd.) ΠΊ Π½Π΅ΡΡΠ΅ΡΠΈΠ»ΡΠ½ΡΠΌ ΡΡΠ»ΠΎΠ²ΠΈΡΠΌ Ρ ΡΡΠ΅ΡΠΎΠΌ ΠΏΠΎΡΠ»Π΅Π΄Π΅ΠΉΡΡΠ²ΠΈΡ Π½Π° ΡΡΠ°ΠΏΠ΅ Π΄ΠΎΡΠ°ΡΠΈΠ²Π°Π½ΠΈΡ
Relevance. In recent years, interest in the edible honeysuckle culture has increased in Russia, the wide distribution of which is hampered by the lack of quality planting material. The technology of clonal micropropagation allows for a short time to obtain a large amount of honeysuckle planting material, more than a thousand regenerated plants per year from one meristematic apex introduced into an in vitro culture. It is hundreds of times more than in traditional methods of vegetative propagation. Adaptation to non-sterile conditions is the final and most crucial stage of clonal micropropagation, the loss of which can be from 50 to 90%. It should be noted that there is practically no research on how the further development of adapted honeysuckle plants takes place during subsequent growing.Methods. Researching of growth regulators of the new generation Superstim 1 and Superstim 2 effect in low and ultra-low doses on the survival rates and development of honeysuckle plants at the stages of adaptation subsequent growing.Results. Superstim 1 is more effective at physiological concentrations β 1 x 10-7 and in the field of ultra-low doses β 1 x 10-14, 1 x 10-15%. At the stage of subsequent growing, a positive after-effect of physiological concentrations β 1x10-3 and 1x10-7 was observed, and an ultra-low dose β 1x10-17%. The growth regulator Superstim 2 at the stages of adaptation and subsequent growing is effectively used only in one concentration β 1x10-16%. The additional foliar treatments at the stage of subsequent growing are not necessary.Β ΠΠΊΡΡΠ°Π»ΡΠ½ΠΎΡΡΡ. Π ΠΏΠΎΡΠ»Π΅Π΄Π½ΠΈΠ΅ Π³ΠΎΠ΄Ρ Π² Π ΠΎΡΡΠΈΠΈ ΡΠ²Π΅Π»ΠΈΡΠΈΠ²Π°Π΅ΡΡΡ ΠΈΠ½ΡΠ΅ΡΠ΅Ρ ΠΊ ΠΊΡΠ»ΡΡΡΡΠ΅ ΠΆΠΈΠΌΠΎΠ»ΠΎΡΡΠΈ ΡΡΠ΅Π΄ΠΎΠ±Π½ΠΎΠΉ, ΡΠΈΡΠΎΠΊΠΎΠ΅ ΡΠ°ΡΠΏΡΠΎΡΡΡΠ°Π½Π΅Π½ΠΈΠ΅ ΠΊΠΎΡΠΎΡΠΎΠΉ ΡΠ΄Π΅ΡΠΆΠΈΠ²Π°Π΅ΡΡΡ ΠΈΠ·-Π·Π° Π΄Π΅ΡΠΈΡΠΈΡΠ° ΠΊΠ°ΡΠ΅ΡΡΠ²Π΅Π½Π½ΠΎΠ³ΠΎ ΠΏΠΎΡΠ°Π΄ΠΎΡΠ½ΠΎΠ³ΠΎ ΠΌΠ°ΡΠ΅ΡΠΈΠ°Π»Π°. Π’Π΅Ρ
Π½ΠΎΠ»ΠΎΠ³ΠΈΡ ΠΊΠ»ΠΎΠ½Π°Π»ΡΠ½ΠΎΠ³ΠΎ ΠΌΠΈΠΊΡΠΎΡΠ°Π·ΠΌΠ½ΠΎΠΆΠ΅Π½ΠΈΡ ΠΏΠΎΠ·Π²ΠΎΠ»ΡΠ΅Ρ Π·Π° ΠΊΠΎΡΠΎΡΠΊΠΈΠΉ ΡΡΠΎΠΊ ΠΏΠΎΠ»ΡΡΠΈΡΡ Π±ΠΎΠ»ΡΡΠΎΠ΅ ΠΊΠΎΠ»ΠΈΡΠ΅ΡΡΠ²ΠΎ ΠΏΠΎΡΠ°Π΄ΠΎΡΠ½ΠΎΠ³ΠΎ ΠΌΠ°ΡΠ΅ΡΠΈΠ°Π»Π° ΠΆΠΈΠΌΠΎΠ»ΠΎΡΡΠΈ, Π±ΠΎΠ»Π΅Π΅ ΡΡΡΡΡΠΈ ΡΠ°ΡΡΠ΅Π½ΠΈΠΉ-ΡΠ΅Π³Π΅Π½Π΅ΡΠ°Π½ΡΠΎΠ² Π² Π³ΠΎΠ΄ ΠΈΠ· ΠΎΠ΄Π½ΠΎΠ³ΠΎ Π²Π²Π΅Π΄Π΅Π½Π½ΠΎΠ³ΠΎ Π² ΠΊΡΠ»ΡΡΡΡΡ in vitro ΠΌΠ΅ΡΠΈΡΡΠ΅ΠΌΠ°ΡΠΈΡΠ΅ΡΠΊΠΎΠ³ΠΎ Π°ΠΏΠ΅ΠΊΡΠ°, ΡΡΠΎ Π² ΡΠΎΡΠ½ΠΈ ΡΠ°Π· Π±ΠΎΠ»ΡΡΠ΅, ΡΠ΅ΠΌ ΠΏΡΠΈ ΠΈΡΠΏΠΎΠ»ΡΠ·ΠΎΠ²Π°Π½ΠΈΠΈ ΡΡΠ°Π΄ΠΈΡΠΈΠΎΠ½Π½ΡΡ
ΠΌΠ΅ΡΠΎΠ΄ΠΎΠ² Π²Π΅Π³Π΅ΡΠ°ΡΠΈΠ²Π½ΠΎΠ³ΠΎ ΡΠ°Π·ΠΌΠ½ΠΎΠΆΠ΅Π½ΠΈΡ. ΠΠ΄Π°ΠΏΡΠ°ΡΠΈΡ ΠΊ Π½Π΅ΡΡΠ΅ΡΠΈΠ»ΡΠ½ΡΠΌ ΡΡΠ»ΠΎΠ²ΠΈΡΠΌ ΡΠ²Π»ΡΠ΅ΡΡΡ Π·Π°ΠΊΠ»ΡΡΠΈΡΠ΅Π»ΡΠ½ΡΠΌ ΠΈ Π½Π°ΠΈΠ±ΠΎΠ»Π΅Π΅ ΠΎΡΠ²Π΅ΡΡΡΠ²Π΅Π½Π½ΡΠΌ ΡΡΠ°ΠΏΠΎΠΌ ΠΊΠ»ΠΎΠ½Π°Π»ΡΠ½ΠΎΠ³ΠΎ ΠΌΠΈΠΊΡΠΎΡΠ°Π·ΠΌΠ½ΠΎΠΆΠ΅Π½ΠΈΡ, ΠΏΠΎΡΠ΅ΡΠΈ Π½Π° ΠΊΠΎΡΠΎΡΠΎΠΌ ΠΌΠΎΠ³ΡΡ ΡΠΎΡΡΠ°Π²Π»ΡΡΡ ΠΎΡ 50 Π΄ΠΎ 90% ΠΌΠ΅ΡΠΈΠΊΠ»ΠΎΠ½ΠΎΠ². Π‘Π»Π΅Π΄ΡΠ΅Ρ ΠΎΡΠΌΠ΅ΡΠΈΡΡ, ΡΡΠΎ ΠΏΡΠ°ΠΊΡΠΈΡΠ΅ΡΠΊΠΈ Π½Π΅Ρ ΠΈΡΡΠ»Π΅Π΄ΠΎΠ²Π°Π½ΠΈΠΉ ΠΎ ΡΠΎΠΌ, ΠΊΠ°ΠΊΠΈΠΌ ΠΎΠ±ΡΠ°Π·ΠΎΠΌ ΠΏΡΠΎΠΈΡΡ
ΠΎΠ΄ΠΈΡ Π΄Π°Π»ΡΠ½Π΅ΠΉΡΠ΅Π΅ ΡΠ°Π·Π²ΠΈΡΠΈΠ΅ Π°Π΄Π°ΠΏΡΠΈΡΠΎΠ²Π°Π½Π½ΡΡ
ΡΠ°ΡΡΠ΅Π½ΠΈΠΉ ΠΆΠΈΠΌΠΎΠ»ΠΎΡΡΠΈ ΠΏΡΠΈ Π΄ΠΎΡΠ°ΡΠΈΠ²Π°Π½ΠΈΠΈ.ΠΠ΅ΡΠΎΠ΄ΠΈΠΊΠ°. ΠΡΠΎΠ²Π΅Π΄Π΅Π½ΠΎ ΠΈΠ·ΡΡΠ΅Π½ΠΈΠ΅ Π²Π»ΠΈΡΠ½ΠΈΡ ΠΏΡΠ΅ΠΏΠ°ΡΠ°ΡΠΎΠ² Π½ΠΎΠ²ΠΎΠ³ΠΎ ΠΏΠΎΠΊΠΎΠ»Π΅Π½ΠΈΡ Π‘ΡΠΏΠ΅ΡΡΡΠΈΠΌ 1 ΠΈ Π‘ΡΠΏΠ΅ΡΡΡΠΈΠΌ 2 Π² ΠΌΠ°Π»ΡΡ
ΠΈ ΡΠ²Π΅ΡΡ
ΠΌΠ°Π»ΡΡ
Π΄ΠΎΠ·Π°Ρ
Π½Π° ΠΏΠΎΠΊΠ°Π·Π°ΡΠ΅Π»ΠΈ ΠΏΡΠΈΠΆΠΈΠ²Π°Π΅ΠΌΠΎΡΡΠΈ ΠΈ ΡΠ°Π·Π²ΠΈΡΠΈΡ ΡΠ°ΡΡΠ΅Π½ΠΈΠΉ ΠΆΠΈΠΌΠΎΠ»ΠΎΡΡΠΈ Π½Π° ΡΡΠ°ΠΏΠ°Ρ
Π°Π΄Π°ΠΏΡΠ°ΡΠΈΠΈ ΠΈ Π΄ΠΎΡΠ°ΡΠΈΠ²Π°Π½ΠΈΡ.Π Π΅Π·ΡΠ»ΡΡΠ°ΡΡ. ΠΡΡΠ²Π»Π΅Π½ΠΎ, ΡΡΠΎ ΠΏΡΠ΅ΠΏΠ°ΡΠ°Ρ Π‘ΡΠΏΠ΅ΡΡΡΠΈΠΌ 1 Π±ΠΎΠ»Π΅Π΅ ΡΡΡΠ΅ΠΊΡΠΈΠ²Π΅Π½ Π² ΡΠΈΠ·ΠΈΠΎΠ»ΠΎΠ³ΠΈΡΠ΅ΡΠΊΠΎΠΉ ΠΊΠΎΠ½ΡΠ΅Π½ΡΡΠ°ΡΠΈΠΈ β 1x10-7% ΠΈ Π² ΠΎΠ±Π»Π°ΡΡΠΈ ΡΠ²Π΅ΡΡ
ΠΌΠ°Π»ΡΡ
Π΄ΠΎΠ· β 1x10-14, 1x10-15%. ΠΠ° ΡΡΠ°ΠΏΠ΅ Π΄ΠΎΡΠ°ΡΠΈΠ²Π°Π½ΠΈΡ Π²ΡΡΠ²Π»Π΅Π½ΠΎ ΠΏΠΎΠ»ΠΎΠΆΠΈΡΠ΅Π»ΡΠ½ΠΎΠ΅ ΠΏΠΎΡΠ»Π΅Π΄Π΅ΠΉΡΡΠ²ΠΈΠ΅ ΡΠΈΠ·ΠΈΠΎΠ»ΠΎΠ³ΠΈΡΠ΅ΡΠΊΠΈΡ
ΠΊΠΎΠ½ΡΠ΅Π½ΡΡΠ°ΡΠΈΠΉ β 1x10-3, 1x10-7%, ΠΈ ΡΠ²Π΅ΡΡ
ΠΌΠ°Π»ΠΎΠΉ Π΄ΠΎΠ·Ρ β 1x10-17%. ΠΡΠ΅ΠΏΠ°ΡΠ°Ρ Π‘ΡΠΏΠ΅ΡΡΡΠΈΠΌ 2 Π½Π° ΡΡΠ°ΠΏΠ°Ρ
Π°Π΄Π°ΠΏΡΠ°ΡΠΈΠΈ ΠΈ Π΄ΠΎΡΠ°ΡΠΈΠ²Π°Π½ΠΈΡ ΡΡΡΠ΅ΠΊΡΠΈΠ²Π½ΠΎ ΠΏΡΠΈΠΌΠ΅Π½ΡΡΡ ΡΠΎΠ»ΡΠΊΠΎ Π² ΠΎΠ΄Π½ΠΎΠΉ ΠΊΠΎΠ½ΡΠ΅Π½ΡΡΠ°ΡΠΈΠΈ β 1x10-16%. Π Π΄ΠΎΠΏΠΎΠ»Π½ΠΈΡΠ΅Π»ΡΠ½ΡΡ
Π½Π΅ΠΊΠΎΡΠ½Π΅Π²ΡΡ
ΠΎΠ±ΡΠ°Π±ΠΎΡΠΊΠ°Ρ
Π½Π° ΡΡΠ°ΠΏΠ΅ Π΄ΠΎΡΠ°ΡΠΈΠ²Π°Π½ΠΈΡ Π½Π΅Ρ Π½Π΅ΠΎΠ±Ρ
ΠΎΠ΄ΠΈΠΌΠΎΡΡΠΈ.
High-Q trenched aluminum coplanar resonators with an ultrasonic edge microcutting for superconducting quantum devices
Abstract Dielectric losses are one of the key factors limiting the coherence of superconducting qubits. The impact of materials and fabrication steps on dielectric losses can be evaluated using coplanar waveguide (CPW) microwave resonators. Here, we report on superconducting CPW microwave resonators with internal quality factors systematically exceeding 5βΓβ106 at high powers and 2βΓβ106 (with the best value of 4.4βΓβ106) at low power. Such performance is demonstrated for 100-nm-thick aluminum resonators with 7β10.5 um center trace on high-resistivity silicon substrates commonly used in Josephson-junction based quantum circuit. We investigate internal quality factors of the resonators with both dry and wet aluminum etching, as well as deep and isotropic reactive ion etching of silicon substrate. Josephson junction compatible CPW resonators fabrication process with both airbridges and silicon substrate etching is proposed. Finally, we demonstrate the effect of airbridgesβ positions and extra process steps on the overall dielectric losses. The best quality factors are obtained for the wet etched aluminum resonators and isotropically removed substrate with the proposed ultrasonic metal edge microcutting