Reflection on multilayer mirrors beam profile and coherence properties

The main advantage of Bragg reflection from a multilayer mirror as a monochromator for hard X rays, is the higher photon flux density because of the larger spectral bandpass compared with crystal lattice reflection. The main disadvantage lies in the strong modulations of the reflected beam profile. This is a major issue for micro imaging applications, where multilayer based monochromators are frequently employed to deliver high photon flux density. A subject of particular interest is the origin of the beam profile modifications, namely the irregular stripe patterns, induced by the reflection on a multilayer. For multilayer coatings in general it is known that the substrate and its surface quality significantly influence the performance of mirrors, as the coating reproduces to a certain degree the roughness and shape of the substrate. This proceedings article reviews recent experiments that indicate potential options for producing wave front preserving multilayer mirrors, as well as new details on the particular mirrors our group has extensively studied in the pas

de Sitter gauge theories and induced gravities

Pure de Sitter, anti de Sitter, and orthogonal gauge theories in four-dimensional Euclidean spacetime are studied. It is shown that, if the theory is asymptotically free and a dynamical mass is generated, then an effective geometry may be induced and a gravity theory emerges. The asymptotic freedom and the running of the mass might account for an In\"on\"u-Wigner contraction which induces a breaking of the gauge group to the Lorentz group, while the mass itself is responsible for the coset sector of the gauge field to be identified with the effective vierbein. Furthermore, the resulting local isometries are Lorentzian for the anti de Sitter group and Euclidean for the de Sitter and orthogonal groups.Comment: Sections added. Text reviewed. References added. 14 pages, no figures. Final version to appear in EPJ

A Superbend X-Ray Microdiffraction Beamline at the Advanced Light Source

Beamline 12.3.2 at the Advanced Light Source is a newly commissioned beamline dedicated to x-ray microdiffraction. It operates in both monochromatic and polychromatic radiation mode. The facility uses a superconducting bending magnet source to deliver an X-ray spectrum ranging from 5 to 22 keV. The beam is focused down to {approx} 1 um size at the sample position using a pair of elliptically bent Kirkpatrick-Baez mirrors enclosed in a vacuum box. The sample placed on high precision stages can be raster-scanned under the microbeam while a diffraction pattern is taken at each step. The arrays of diffraction patterns are then analyzed to derive distribution maps of phases, strain/stress and/or plastic deformation inside the sample

Soft X-ray beamline for surface EXAFS studies in the energy range 60 < hr < 11100 eV at the Daresbury SRS

SIGLEAvailable from British Library Document Supply Centre- DSC:8665.9(DL/SCI/TM--48E) / BLDSC - British Library Document Supply CentreGBUnited Kingdo

Structure and kinetics of Sn whisker growth on Pb-free solder finish

Standard Leadframes used in surface mount technology are finished with a layer of eutectic SnPb for passivation and for enhancing solder wetting during reflow. When eutectic SnPb is replaced by Pb-free solder, especially the eutectic SnCu, a large number of Sn whiskers are found on the Pb-free finish. Some of the whiskers are long enough to become shorts between the neighboring legs of the leadframe. How to suppress their growth and how to perform accelerated test of Sn whisker growth are crucial reliability issues in the electronic packaging industry. In this paper, we report the study of spontaneous Sn whisker growth at room temperature on eutectic SnCu and pure Sn finishes. Both compressive stress and surface oxide on Sn are necessary conditions for whisker growth. Structure and stress analyses by using the micro-diffraction in synschrotron radiation are reported. Cross-sectional electron microscopy, with samples prepared by focused ion beam, are included