Improved Sensing Characteristics of a Novel Pt/HfTiO2/SiC Schottky-Diode Hydrogen Sensor

published_or_final_versio

Effects of annealing temperature on sensing properties of Pt/HfO2/SiC Schottky-diode hydrogen sensor

Hafnium oxide (HfO 2) is successfully used as gate insulator for fabricating Metal-Insulator-SiC (MISiC) Schottky-diode hydrogen sensor. Sensors undergone N 2 annealing at different temperatures are fabricated for investigation. The hydrogen-sensing properties of these samples are compared with each other by taking the measurements at high temperature under various hydrogen concentrations using a computer-controlled measurement system. Experimental results show that sensitivity increases with the annealing temperature. Higher annealing temperature can enhance the densification of the HfO 2 film; improve the oxide stoichiometry; and facilitate the growth of a SiO 2 interfacial layer to give better interface quality, thus causing a remarkable reduction of the current of the sensor under air ambient. The effects of hydrogen adsorption on the barrier height and hydrogen-reaction kinetics are also investigated. © 2008 IEEE.published_or_final_versio

Enhanced sensing performance of MISiC schottky-diode hydrogen sensor by using HfON as gate insulator

MISiC Schottky-diode hydrogen sensor with HfON gate insulator fabricated by NO nitridation is investigated. The hydrogen-sensing characteristics of this novel sensor are studied by doing steady-state and transient measurements at different temperatures and hydrogen concentrations using a computer-controlled measurement system. Experimental results show that this novel sensor can rapidly respond to hydrogen variation and can give a significant response even at a low H 2 concentration of 48-ppm, e.g., a sensitivity of 81% is achieved at 450°C and 2.5 V, which is two times higher than its HfO 2 counterpart. The enhanced sensitivity of the device should be attributed to a remarkable reduction of the current of the sensor before hydrogen exposure by the NO nitridation because the NO nitridation can passivate the O vacancies in the insulator and facilitate the formation of a SiO 2 interlayer to suppress the leakage current associated with high-k materials. © 2006 IEEE.published_or_final_versio

Effects of sputtering and annealing temperatures on MOS capacitor with HfTiON gate dielectric

In this work, Al/HfTiON/n-Si capacitors with different sputtering and annealing temperatures are studied. Larger accumulation capacitance and flat-band voltage are observed for samples with higher sputtering or post-deposition annealing temperature. Gate conduction mechanisms are only affected by sputtering temperature slightly. The flat-band voltage shift and interface-state density at midgap under high-field gate injection and substrate injection are investigated, and the results imply electron detrapping in the gate dielectric. ©2009 IEEE.published_or_final_versionThe IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC 2009), Xi'an, China, 25-27 December 2009. In Proceedings of EDSSC, 2009, p. 209-21

A comparison of MISiC Schottky-diode hydrogen sensors made by NO, N 2O, or NH 3 nitridations

MISiC Schottky-diode hydrogen sensors with gate insulator grown in three different nitridation gases (nitric oxide (NO), N 2O, and NH 3) are fabricated. Steady-state and transien-t-response measurements are carried out at different temperatures and hydrogen concentrations using a computer-controlled measurement system. Experimental results show that these nitrided sensors have high sensitivity and can give a rapid and stable response over a wide range of temperature. This paper also finds that N 2O provides the fastest insulator growth with good insulator quality and hence the highest sensitivity among the three nitrided samples. The N 2O- nitrided sensor can give a significant response even at a low H 2 concentration of 48-ppm H 2 in N 2, indicating a potential application for detecting hydrogen leakage at high temperature. Moreover, the three nitrided samples respond faster than the control sample. At 300°C, the response times of the N 2O, NO, and NH 3-nitrided sample to the 48-ppm H 2 in N 2 are 11, 11, and 37 s, respectively, as compared to 65 s for the control sample without the gate insulator. © 2006 IEEE.published_or_final_versio

Charge-Trapping Characteristics of BaTiO3 with and without Nitridation for Nonvolatile Memory Applications

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Effects of fluorine plasma and ammonia annealing on pentacene thin -film transistor with ZrLaOx as gate dielectric

Pentacene organic thin-film transistor (OTFT) based on ZrLaOx gate dielectric is proposed and has been fabricated. The effects of fluorine plasma and ammonia annealing on the properties of the OTFT have been studied. It reveals that the plasma treatment can greatly improve carrier mobility and shift the threshold voltage in the positive direction. With a threshold voltage less than 0.5 V, the OTFT can work at very low supply voltage. On the other hand, the ensuing ammonia annealing counteracts the plasma treatment and shifts the threshold voltage in the opposite direction. © 2012 IEEE.published_or_final_versio

Charge-trapping characteristics of niobium-doped La2O3 for nonvolatile memory applications

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Nb-Doped La2O3 as Charge-Trapping Layer for Nonvolatile Memory Applications

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A low-frequency noise model with carrier generation-recombination process for pentacene organic thin-film transistor

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