What happened to the Cosmological QCD Phase Transition?

The scenario that some first-order phase transitions may have taken place in the early Universe offers us one of the most intriguing and fascinating questions in cosmology. Indeed, the role played by the latent "heat" or energy released in the phase transition is highly nontrivial and may lead to some surprising, important results. In this paper, we take the wisdom that the cosmological QCD phase transition, which happened at a time between 10^(-5) sec and 10^(-4) sec or at the temperature of about 150 MeV and accounts for confinement of quarks and gluons to within hadrons, would be of first order. To get the essence out of the scenario, it is sufficient to approximate the true QCD vacuum as one of degenerate theta-vacua and when necessary we try to model it effectively via a complex scalar field with spontaneous symmetry breaking. We examine how and when "pasted" or "patched" domain walls are formed, how long such walls evolve in the long run, and we believe that the significant portion of dark matter could be accounted for in terms of such domain-wall structure and its remnants. Of course, the cosmological QCD phase transition happened in the way such that the false vacua associated with baryons and many other color-singlet objects did not disappear (that is, using the bag-model language, there are bags of radius 1.0 fermi for the baryons) - but the amount of the energy remained in the false vacua is negligible. The latent energy released due to the conversion of the false vacua to the true vacua, in the form of "pasted" or "patched" domain walls in the short run and their numerous evolved objects, should make the concept of the "radiation-dominated" epoch, or of the "matter-dominated" epoch to be re-examined.Comment: 16 pages, 1 figur

Analytical Study of Blowing Boundary-Layer Control for Subsonic V/STOL Inlets

The analytical methods used to study blowing boundary-layer control (BLC) for subsonic V/STOL inlets are described. The methods are then shown to give good agreement with experimental results, both with and without blowing BLC. Finally, because of this good agreement, the methods were used to determine analytically the optimum (minimum blowing power required) location and height for a blowing slot within a subsonic V/STOL inlet

Numerical solution of a three-dimensional cubic cavity flow by using the Boltzmann equation

A three-dimensional cubic cavity flow has been analyzed for diatomic gases by using the Boltzmann equation with the Bhatnagar-Gross-Krook (B-G-K) model. The method of discrete ordinate was applied, and the diffuse reflection boundary condition was assumed. The results, which show a consistent trend toward the Navier-Stokes solution as the Knudson number is reduced, give us confidence to apply the method to a three-dimensional geometry for practical predictions of rarefied-flow characteristics. The CPU time and the main memory required for a three-dimensional geometry using this method seem reasonable

A numerical analysis applied to high angle of attack three-dimensional inlets

The three-dimensional analytical methods used to analyze subsonic high angle of attack inlets are described. The methods are shown to be in good agreement with experimental results for various three-dimensional high angle of attack inlets. The methods are used to predict aerodynamic characteristics of scarf and slotted-lip inlets

A summary of V/STOL inlet analysis methods

Recent extensions and applications of the methods are emphasized. They include the specification of the Kutta condition for a slotted inlet, the calculation of suction and tangential blowing for boundary layer control, and the analysis of auxiliary inlet geometries at angles of attack. A comparison is made with experiment for the slotted inlet. An optimum diffuser velocity distribution was developed

The Role of the Substrate on Pattern-Dependent Charging

Monte Carlo simulations of charging and profile evolution during plasma etching reveal that the substrate can mediate current imbalance across the wafer. This function couples patterned areas, where the electron shading effect dominates, to substrate areas directly exposed to the plasma. When a net positive current flows through the pattern features to the substrate, increasing the exposed area decreases the substrate potential, thereby causing notching at the connected feature sidewalls to worsen, in agreement with experimental observations