3 research outputs found
Patterned silicon substrates: a common platform for room temperature GaN and ZnO polariton lasers
A new platform for fabricating polariton lasers operating at room temperature
is introduced: nitride-based distributed Bragg reflectors epitaxially grown on
patterned silicon substrates. The patterning allows for an enhanced strain
relaxation thereby enabling to stack a large number of crack-free AlN/AlGaN
pairs and achieve cavity quality factors of several thousands with a large
spatial homogeneity. GaN and ZnO active regions are epitaxially grown thereon
and the cavities are completed with top dielectric Bragg reflectors. The two
structures display strong-coupling and polariton lasing at room temperature and
constitute an intermediate step in the way towards integrated polariton
devices