Neural Representations of Airflow in Drosophila Mushroom Body

The Drosophila mushroom body (MB) is a higher olfactory center where olfactory and other sensory information are thought to be associated. However, how MB neurons of Drosophila respond to sensory stimuli other than odor is not known. Here, we characterized the responses of MB neurons to a change in airflow, a stimulus associated with odor perception. In vivo calcium imaging from MB neurons revealed surprisingly strong and dynamic responses to an airflow stimulus. This response was dependent on the movement of the 3rd antennal segment, suggesting that Johnston's organ may be detecting the airflow. The calyx, the input region of the MB, responded homogeneously to airflow on. However, in the output lobes of the MB, different types of MB neurons responded with different patterns of activity to airflow on and off. Furthermore, detailed spatial analysis of the responses revealed that even within a lobe that is composed of a single type of MB neuron, there are subdivisions that respond differently to airflow on and off. These subdivisions within a single lobe were organized in a stereotypic manner across flies. For the first time, we show that changes in airflow affect MB neurons significantly and these effects are spatially organized into divisions smaller than previously defined MB neuron types

High density plasma enhanced chemical vapor deposition of optical thin films

Deposition of pure and Ge-doped silica as well as silicon oxynitride films has been studied in a recently developed matrix distributed electron cyclotron resonance (MDECR) reactor. Process parameters were optimized in order to obtain optical quality thin films at low substrate temperatures and high deposition rates without post-deposition treatment. The choice of injection system is shown to be of crucial importance for the deposition of high quality materials in low pressure PECVD. It has been found that injecting silane near the surface allows to obtain films with a low OH absorption independently of silane flow i.e. growth rate in a certain range of process parameters. On the contrary, in the case of uniform distribution of silane in the reactor volume the hydrogen content increases with silane flow, which affects the quality of films deposited at higher rates. With the optimized injection system, stress-free silica films with a low absorption have been deposited at the rates up to 70 nm/min at temperatures lower than 150 °C. Non-absorbing oxynitride films with a controllable refractive index ranging from 1.46 to 1.86 have been obtained from SiH4/O2/N2 mixtures. Ge-doped silica films with a Ge content of up to 4% has been deposited using a mixture GeH4 in H2 as a dopant. The properties of deposited films have been studied as a function of process parameters. The results show that the MDECR concept, that permits, in principle, unlimited scaling of substrate size, can be technology of choice for the deposition of optical thin films and functional coatings

Control and monitoring of optical thin films deposition in a Matrix Distributed Electron Cyclotron Resonance reactor

A range of silicon-based optical thin films have been deposited in a matrix distributed electron cyclotron resonance (MDECR) reactor. Process parameters were optimized in order to obtain optical quality thin films at low substrate temperatures and high deposition rates without post-deposition treatment. Stoichiometric silica films have been deposited at the rates up to 70 nm/min at temperatures lower than 150 °C. Oxynitride films with a controllable refractive index ranging from 1.46 to 1.86 have been obtained from SiH4/O2/N2 mixtures. Real time process control by multichannel ellipsometry has been implemented and successfully applied for the deposition of silica, silicon oxynitrides and amorphous silicon. Better than 0.3% in thickness accuracy was achieved in high rate deposition of silica layers of various predefined thickness. Refractive indices were determined in real-time with an absolute precision of 0.005–0.02. The control algorithm was used for fabrication of multilayer optical filters. The results show that the MDECR concept coupled with real-time process control by ellipsometry can be technology of choice for the deposition of interference coatings

Plasma enhanced chemical vapour deposition of silica thin films in an integrated distributed electron cyclotron resonance reactor

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